Inductively Coupled Plasma
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Inductively Coupled Plasma Spectrometry
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Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Optical Emission Spectrometer
EXPEC-6000
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An analytical technique used to determine how much of certain elements are in a sample.
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Inductively Coupled Plasma
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Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
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Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
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With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
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ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Chemical Analysis and Corrosion Testing
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Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
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Industry-leading performance, speed and ease of use – no compromises
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Emission Spectroscopy
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ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Threaded Coupling Adapter, G2, G6, G10, ITA, For Conduit Harnessing Assemblies/Clamps
410112599
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The Adapter is designed to accommodate military and commercial circular backshells for conduit or strain relief when designing for general and heavy-duty applications. The male thread size is 1.625-18 for this application.
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Hose Couplings
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WITT quick couplers / hose couplings SK100 for gases provide a safe, quick and distinctive connection of the hose with outlet points or working equipment.An automatic cut-off valve prevents any gas flow when disconnected. WITT hose couplings have an integrated non-return valves which prevents the formation of explosive gas mixtures in the pipeline.
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Remote Plasma Source
MAXstream
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Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning. The MAXstream is available in 3, 6, 8, 10, and 12 SLPM NF3 flow rates to optimize price and performance.
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Plasma Process Monitors
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Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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Microwave Plasma Subsystems
AX2600 And AX2700
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The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
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Inductive Sensors
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In general, inductive proximity switches consist of four basic elements: a coil, an oscillator, a threshold switch and an output stage with short-circuit protection.The oscillator generates a high frequency, electromagnetic alternating field which is emitted from the active face of the coil.Eddy currents are induced in a metal object that enters this field. These eddy currents draw energy from both the electromagnetic field and from the oscillator which is consequently attenuated.The more energy taken the closer the metal object moves towards the active face. The threshold switch switches on the output stage at a defined attenuation value.In proximity switches with a DC voltage supply, this switch is designed as an NPN transistor which switches the connected load to the negative pole or as a PNP transistor which switches the load to the positive pole. The output stage is a thyristor or a triac in AC voltage switches.
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HV Coupling Capacitors
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Our high-voltage coupling capacitors are a main component of our partial discharge test stations. They serve to decouple the partial discharge impulses and act as a voltage divider, the output voltage of which is matched to our partial discharge measuring devices (with integrated voltage measurement) and peak voltage measuring devices. These high-voltage components are also available separately in their various designs, sizes, capacities and voltage ranges.
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Downhole Induction Probe
VECTEM
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The three component downhole VECTEM V receiver probe is designed to be used in conjunction with the terraTEM24. It is available as a 42mm outer diameter tool. The VECTEM V is connected to the terraTEM24 via a four core cable which provides power, communications, and signal monitoring.
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Inductive Sensor
Ampstik®
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The Ampstik is easy to use and provides accurate information to anyone working with medium and high voltage. It gives line personnel the right answers so they have the ability to make decisions in the field.
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UV Plasma Sources
UVS300|UVS 10/35
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The UVS300 and UVS 10/35 are UV Plasma sources with high intensity, working with different gases.
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Coupling Decoupling Networks (CDN)
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Beijing KeHuan Century EMC Technology Co,.LTD
Beijing KeHuan Coupling Decoupling Networks (CDN)
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Induction Bearing Heater Tools
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PRÜFTECHNIK Condition Monitoring GmbH
Induction bearing heating tools are the safest and most effective method for mounting bearings onto shafts. Bearing induction heaters ensure even and controlled heating of the bearing and work pieces. Our induction heating tools for small and large bearings are safe and easy to use.
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RF Plasma Generators
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Choose from a broad range of RF plasma generators and access unique features for configuration, control, and application requirements. From various mounts and sizes to full digital control and plasma dynamic response, our RF generators can ignite your process innovation.
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Unclamped Inductive Load Tester
ITC75300
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The ITC75300 is a 400 amp version of the ITC75100 which performs ruggedness testing of power MOSFET’s, IGBT’s and diodes that conforms to MIL-STD-750 method 3470 by stressing them to controlled energy levels, accomplished by the devices driving an unclamped inductive load. Improved Test Specifications allow complete control of test parameters.
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Coupling Decoupling Network (CDNE)CDN
Emissions
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CDNEs are based on the CDN as specified in IEC61000-4-6 (Conducted RF Immunity test). In this test, the CDN is used for the coupling of RF onto a cable. In principle, the CDN can be used in reverse, ie coupling any RF on the cable out to an analyser. In an earlier version of EN 55015, these CDNs were specified as suitable for measuring emissions. However, the current version of the standard specifies a CDNE which is essentially a CDN refined to deliver higher accuracy particularly at higher frequencies.
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Inductive sensors
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Inductive sensors are signal generators which detect function-related movements of processing machines, robots, production lines, conveyor systems etc. in a contactless fashion, and transform them into electrical signals.
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Thin Films, Plasma and Surface Engineering
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A residual gas analyser for vacuum process analysis. Measures the vacuum process gas composition, contamination and leak detection.
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Remote Plasma Sources
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Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
