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Inductively Coupled Plasma
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Inductively Coupled Plasma Emission Spectroscopy
Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Inductively Coupled Plasma Spectrometry
Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
Industry-leading performance, speed and ease of use – no compromises
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ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Inductively Coupled Plasma
Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Chemical Analysis and Corrosion Testing
Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Inductive Sensors
Inductive Proximity Switches, self contained, depend on the output of an oscillator for their operation. The oscillator resonant circuit uses an open core coil to produce a concentrated high frequency electromagnetic (RF) field, which emerges from the active surface of the sensor. If a metal target (or other electrically conductive material) enters this field, eddy currents will be induced in it, causing the resonating oscillator to be damped.
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Remote Plasma Source
MAXstream
Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning. The MAXstream is available in 3, 6, 8, 10, and 12 SLPM NF3 flow rates to optimize price and performance.
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Inductive Sensor
Ampstik®
The Ampstik is easy to use and provides accurate information to anyone working with medium and high voltage. It gives line personnel the right answers so they have the ability to make decisions in the field.
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Plasma Process Monitors
Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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Remote Plasma Sources
Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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Inductive Sensors
Inductive sensor designed to detect shaft speed, shaft position, gate position, or object presenceTotally sealed constructionMulti-voltage 24 - 240 VAC/VDCDetects ferrous targets up to 5/16" (8 mm)IP 65 Protection
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Inductive Coupler
CLAMPMITTER™
The CLAMPMITTER™ is a unique tool for inductive coupling. This self-contained inductive transmitter increases productivity, promotes safety and simplifies locates by condensing the transmitter and inductive coupler into one cordless package. Whether climbing down a manhole or accessing a utility box, the Clampmitter is an easy alternative to suiting up with a full transmitter and wired coupler.
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2 MHz RF Plasma Generators
NOVA® Series
The NOVA ; RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Plasma Etcher / Asher
PA-3000-A ETCHER
Process chamber with plasma view window and full access hinged door. RF hot process shelves with opposing ground electrodes. Throttle valve. Capacitance manometer. Internal pumping system with option for Fomblin filled chemical series mechanical pump. Flow control electronics and cabinet. Up to four mass flow control assemblies can be incorporated into our system. RF matching network and 600 watt maximum power supply. Fully enclosed cabinet. Custom internal fixturing to accommodate specific substrate shapes and sizes. Plasma gas selection for optimal performance.
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Coupling Decoupling Network
TBCDN-M4
The TBCDN-M4 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Inductive Load Banks
L-Series
L-series inductive load banks are devices which contain inductive loads, apply the load to an electrical power source and dissipate the reactive power of the electrical source. L-series load banks are designed for portable and fixed applications. Hilkar brand L-series load banks have robust design and are specifically designed for corrosive environments. Load banks can be controlled via local, remote, wireless remote or automatic control systems.
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Plasma Emission Detectors for Gas Chromatographs
Our patented Plasma Emission Detector is available for integration into any gas chromatography system or installation. It has been designed for ‘plug and play’ installation and to allow for analysis of impurities from PPB to % levels using either capillary or packed columns.
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CDN - Coupling / Decoupling Networks
The Coupling- / Decoupling Networks are used to inject common mode disturbances to Equipment under Test (EuT). Further the CDNs provide sufficient decoupling between Auxiliary Equipment (AE) and disturbance signal. The requirements for CDN and their application are described in the standard IEC 61000-4-6 (Immunity to conducted disturbances, induced by radio-frequency fields). CDNs have a common mode impedance of 150 Ohm and are available for a multitude of cable types and connectors.
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Coupling Decoupling Network
TBCDN-M3
The TBCDN-M3 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Remote Plasma Sources
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Inductive sensors
Inductive sensors are signal generators which detect function-related movements of processing machines, robots, production lines, conveyor systems etc. in a contactless fashion, and transform them into electrical signals.
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Versatile AFM Optical Coupling
TRIOS
The TRIOS platform is an advanced research instrument that provides the entry path for researchers in materials science, biology, spectroscopy and photonics. TRIOS is the most versatile optical coupling platform providing three ports for optical spectroscopy measurements with top-down, side (oblique) and inverted accesses to the AFM tip and sample.If you work with opaque and/or transparent samples, either in air or in liquid looking at nanoscale structures and near-field optical properties investigation, the TRIOS platform is the right solution for you. It perfectly combines upright optical, inverted optical, and atomic force microscopies, and unleash all the power of both techniques providing instrument adjustment and measurement automation, high resolution and integration flexibility. Such performance is only available from HORIBA.
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HV Coupling Capacitors
Our high-voltage coupling capacitors are a main component of our partial discharge test stations. They serve to decouple the partial discharge impulses and act as a voltage divider, the output voltage of which is matched to our partial discharge measuring devices (with integrated voltage measurement) and peak voltage measuring devices. These high-voltage components are also available separately in their various designs, sizes, capacities and voltage ranges.
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Digital Displacement Inductive Sensor
EX-V Series
High-speed, high-accuracy, digital inductive displacement sensors with sub-micron resolution and an ultra-fast 40,000 samples/sec. sampling rate. Automatic Bottom-dead-center measurement mode. High-speed sampling : 40,000 samples/second. Digital Inductive Displacement Sensor
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Inductive Heater
BD-1.01
The device is assigned to heat the bars to the state, which allows upsetting. The DB-1.01 heater characterizes especially high watt-hour efficiency (bigger than 98%) thanks to suitable concentration of electromagnetic field in the heating zone of inductor (the solution secured by patent). It is possible to addapt the nductive heater BD-1.01 for heating any others bars.
