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Product
wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Product
Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Product
Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Product
Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Product
Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Product
EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Product
Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Product
PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Product
Ultraviolet Analyzers
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Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Product
Ultraviolet Checker
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For magnetic particle testing. Intensity of ultraviolet can be read directly in mw/c directly.
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Product
Data Logger for Extremely Low Temperature
DSR-ELT
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Special probe using military industrial technology supports measuring temperature ultra low to -196 Original fittings for sensor connection, ensures 100,000 plugs Support single DSR connecting to PC via USB interface, and multiple DSR grouped in RS485 or LAN networking for central management Suitable for medical refrigerator, biological specimens preservation, scientific research and other applications
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Product
Ultraviolet Light Distribution Measurement Film
UVSCALE
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UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Product
"Extremely Random" Precision Noise Generator
Model 3025
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The Model 3025, "Extremely Random"TM Precision Noise Generator supplies White and Pink Noise, and a 1 kHz reference signal. Crystal controlled - the pseudo random circuitry provides a 6.5 Day pseudo-random cycle time, assuring a "Extremely Random"TM noise source.
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Product
Light Booths
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Konica Minolta Sensing Americas, Inc
Konica Minolta’s Light Booth products provide accurate results when inspecting a range of unique products including inks, paints, plastics, textiles, paper and colorants. Light booths simulate lighting conditions which allows testing in a multitude of different lighting conditions. This allows for incredibly precise color measurements in a spectrum of different lights and angles.
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Product
Light Source
UVF-352S
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This is the ultra high power unit fully utilizing the high stability and long life 350watt ultra high pressure mercury lamp. The unit is made to compact size.
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Product
Light source
UVM-MP
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Measurement of maximum of 6 points is possible. By use of thee sensor amplifier box, distance between the light receiving inlet and the controller can be extended to 10 meters. Measurement start signals can be independently output by remote control. This is useful for the light source fixtures integrating shutter mechanism.
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Product
Light Meters
LXP-2
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The digital light meter is a precision instrument used to measure illuminance (Lux, footcandle) in the field. It is meet CIE photopic spectral response. It is fully cosine corrected for the angular incidence of light. The illuminance meter is compact, tough and easy to handle owing to its construction. The light sensitive component used in the meter is a very stable, long-life silicon photo diode and spectral response filter.
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Product
Light Source
UVF-204S
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This is the ultra compact and light weight high power unit fully utilizing characteristics of the high stability and long life 200watt mercury xenon lamp.
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Product
Light Sensors
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ams provides the industry’s broadest portfolio of high-performance and high-sensitivity digital discrete and integrated module optical sensors.
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Product
Light Sources
LS 150 Xenon Arc Lamp Source
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Model LS-150 is a Patented US Pat. No. 8116017 low cost, high output 150 watt Xe arc lamp based light source. The entire source, power supply, lamp, and optical compartment are housed in an extremely compact enclosure, 9 x 6 x 11 inches. The unit's base allows mounting on inch or metric spaced optical tables with the optics centered over the hole pattern to allow for easy integration with the rest of your setup.
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Product
Economic Extreme Power Temperature Forcing System
ECO Cool
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ECO Cool® Economical Powerful - Thermal Forcing System.Exceptionally Powerful, Economical & Reliable
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Product
Reading Lights
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Our Carat® lights offer a wide range of fully customized reading light solutions crafted for your unique needs.
