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- Taylor Dynamometer, Inc.
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Towing Dynos for Full-Sized Cars & Light Trucks
Designed to maintain 2,248 to 5,620 lb (10,000 to 25,000 N) of constant drawbar pull, our towing dynamometers for full-sized cars to light trucks are powered by an industrial generator to provide unlimited testing at low speeds. Each model features aluminum frame, independent suspension, aero dynamic body and wireless touchscreen controller.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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X-Ray Cameras for Soft X-Ray, VUV, and EUV Applications
SOPHIA® XO
Teledyne Princeton Instruments
SOPHIA® XO offers high-sensitivity (>95% QE) and high-speed for the widest range of VUV and x-ray detection, with thermoelectric cooling up to -90℃ and high frame rates. With a rotatable, industry-standard CF flange and high-vacuum seal design the software-selectable gains and readout speeds make this camera well suited for UHV applications.
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Ultraviolet Analyzers
Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Extreme Environment Sensors
Kaman Fuzing & Precision Products
For high pressure, low temperature, and high temperature applications* For applications requiring high accuracy, high reliability, and structural integrity.* Operating temperatures from -320°F to +1000°F (+1200°F short term).* Displacement systems withstand pressures up to 3500 or 5000 psi.* Dual-coil sensor design effectively minimizes radiation effects.* Hermetically sealed and laser welded.* Unaffected by environmental contaminants.
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Ultraviolet Light Distribution Measurement Film
UVSCALE
UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Light
Welcome to Thorlabs; below you will find links to light emitters, sources, and controllers, a subset of our entire line of photonics products. Our light sources are conveniently separated into coherent and incoherent sources. The coherent source category includes laser diodes, laser diode modules, tunable lasers, HeNe lasers, and femtosecond lasers, while the incoherent source link brings you to a selection of LEDs, white light, and broadband SLD sources. The Quantum Electronics category includes optical amplifiers, modulators, and gain elements that are frequently used in research and OEM applications. All of our light sources and optical amplifiers are supported by an extensive line of mounts, sockets, TEC controllers, and current controllers.
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Ultraviolet Checker
For magnetic particle testing. Intensity of ultraviolet can be read directly in mw/c directly.
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Light Microscopy
Materials Evaluation and Engineering
MEE has a variety of light microscopes with magnifications ranging from 5X to 2400X. Each microscope is connected to a camera with digital image capture for subsequent measurements and/or additional image analyses.
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Light Simulator
From the review of the scientific development history, reliable and stable artificial light sources have played a very important role in the past century. For example, the artificial solar simulator is an important part of simulating sunlight to ensure accurate performance of PV characterization. With the growth of light sensor applications, more and more requirement of light simulators (or artificial light sources) explored. One of the core technologies of Enlitech is the artificial light sources. We can manipulate different lamp types (short arc lamps, LEDs, filament lamps et. al.) to generate different spectrum-form in different light intensity levels, beam sizes, and wavelength ranges. We have launched different artificial light source products for different applications fields. For instance, SS-X series solar simulators and ILS-30 ambient light simulator are for the PV field, HAAS is highly accurate star light simulator for the space field, and ALS-300 is a general-purpose light source in science research field. These products can not only meet the needs of your application, but also speed up the process of your research or mass-production.
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Light Source
UVM-SP-JW
Readouts of UV intensity and cumulative luminescence count are prompted either on the front panel or via the externally connected remote signal control. The UV intensity detection segment is intended to measure a specific intensity of light signals, while the cumulative luminescence count is designed to tally a cumulative count on all UV intensities measured, in conjunction with real-time calibration.
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Solar Ultraviolet Pyranometers
UVR1-T, UVR1-A, &
The Middleton Solar UVR1 series are precision filter radiometers for measuring solar global ultraviolet irradiance. The UVR1-T and UVR1-A are suitable for air pollution monitoring. The UVR1-B is suitable for biological and human erythema (sunburn) monitoring.
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Light Meter
Ideal for measuring mercury, xenon, metal halide or fluorescent lamps, commonly used for studies in the UVA region, as well as sunlight.
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Light Soaker
MESO-11
Greensolar Equipment Manufacturing Ltd.
The Light Soaker (MESO) is used in photovoltaic production lines for reliability testing. Its purpose is to expose the PV panels with a constant, high intensity light to get it deteriorated. Measuring the time dependent deterioration of the electrical parameters of the PV structure the reliability parameters could be defined.
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Light Meters
LXP-10A
The new LXP digital light meter family allows for a very precise measurement of illuminanace. Thanks to very high resolution (resolution 0.001 lx ) allows for escape route emergency light measurement. All of three light meter have built-in memory for measurement result storing, and additional function making work much easier.
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