Mask
screens a surface or a signal to a certain shape.
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Product
Tabletop Front & Backside Mask Aligner
Model 200IR
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The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative for R&D or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z-axis.
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Product
Mask Alignment Systems
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EVG’s inventions, such as the world’s first bottom-side alignment system in 1985, have pioneered and set the industry standards in both top and double-sided lithography, aligned wafer bonding and nanoimprint lithography. EVG contributes in these areas through continuous development of mask aligner product generations to augment this core lithography technology.
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Product
GENERAL INSPECTION MACHINE AFTER SOLDER MASK
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DVI is a technology of automated optical inspection, which can inspect deep to the difference from semi-transparent layers or semi-reflective layers.
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Product
MRM(Mask)
MRM Series
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- Fully automated system that can produce masks by automating the mask production process such as fabric supply, molding, cutting, and bonding.
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Product
MASK DR-SEM
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Our defect review SEM tools perform detailed reviews of minute defects on photomasks.
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Product
MASK MVM-SEM® E3600 Series
E3640
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Ongoing semiconductor process shrinks are driving new demand for stable, highly precise measurement of pattern dimensions for photomask and wafer production. The E3640 satisfies these requirements with industry-leading precision measurement capabilities and upgraded functionality that enhances mask R&D and production efficiency.
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Product
Tabletop Mask Aligner
Model 200
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The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a tableop mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.
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Product
Bounded Output Mask
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The bounded output mask provides a means of ensuring that measurements of TI according to IEC 62359 can satisfy the requirement of only determining the ultrasonic output through an area of 1 cm x 1 cm.
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Product
MASK MVM-SEM® E3600 Series
E3650
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Amid the progress of multiple-exposure technology, and the development of finer-pitch and more complicated circuits, as well as increases in the number of masks and the number of measurement points on each mask, the size of wiring patterns formed on photomasks needs to be measured and evaluated stably with high precision. Advantest’s E3600 series meets the needs of state-of-the-art devices with high measurement repeatability and stable throughput.
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Product
Custom Solutions for Mask Aligners
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OAI offers custom designed solutions built to your unique specification.
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Product
Mask Foreign Matter Inspection Device
PR-PD2HR
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Efficient foreign matter inspection and measurement with high yield.
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Product
Automated Mask Aligner with Integrated Mask Changer
Model 6000A-MC
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The Model 6000A-MC is a precision system combining OAI’s Model 6000, Automated Production Mask Aligner, with an integrated mask changer. The mask changer can handle from 10 to 150 masks. Ideal for both semiconductor and bio-tech applications. It also is designed with a bar code reader to assure each mask is coordinated to the right process. Please contact OAI for further product information.
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Product
DUV Mask Aligner
Model 200E
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OAI’S Model 200E DUV Mask Aligner performs all the functions of the tabletop Model 200 Mask Aligner but utilizes a 185nm Excimer Lamp as the UV light source. It is used for Biotechnology Processing.
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Product
Mask Flatness Measurement System
Tropel UltraFlat System
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The Tropel® UltraFlatTM 200 Mask System was designed specifically for the photomask industry. It delivers the lowest measurement uncertainty for ever-tightening mask flatness specifications. Shrinking device features require not only flatter wafers, but flatter masks.
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Product
Medical Mask Gas Exchange Pressure Difference Tester
DRK371-II
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Shandong Drick Instruments Co., Ltd.
It is used to measure the gas exchange pressure difference of medical surgical masks and other products.
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Product
350 MHz, 2 Analog Plus 16 Digital Channels Oscilloscope
MSOX3032A
Oscilloscope
350 MHz2 analog plus 16 digital channels Easily view your signals on the 8.5-inch WVGA display Capture more data with up to 4 Mpts memory See more signal detail with 1,000,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add bandwidth, memory, 20 MHz arbitrary waveform generator, 3-digit voltmeter, serial trigger and analysis, segmented memory & mask testing at any time
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Product
Phase Masks
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Phase masks are the production tool used to write gratings in fibers and waveguides. Ibsen Phase masks incorporate unbeatable, interferometric (holographic) patterning technology into a production friendly Phase mask.
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Product
ARINC-style Attitude Gyroscopes
1U367-series
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The 1U367 has a pictorial horizon mask and a fixed airplane. The mask moves to indicate climb, dive, and bank. Bank and pitch attitudes are diaplayed so that the pilot's sensing of the gyro's horizon indication is the same as the interpretation of the relationship between the wings of the aircraft and the natural horizon during visual flight.
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Product
Light and Energy Meter
Model 656
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OAI Model 656 Meter is designed for use with all mask aligners and flood exposure systems. For over 45 years, OAI is a world leader in UV Light & Energy Measurement Instrumentation used for reliable accurate calibrated control of the photolithography processes in the Semiconductor, MEMS, Wafer Packaging and Wafer Bumping Industries.
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Product
Standard Attitude Gyroscopes
5000B-series
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The 5000B is an air-driven gyro that has a pictorial horizon mask and fixed airplane. The mask moves to indicate climb, dive, and bank. Bank and pitch attitudes are displayed so that the pilot’s sensing of the gyro indication is the same as the interpretation of the relation between the wings of the aircraft and the natural horizon during visual flight.
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Product
Mixed Signal Oscilloscope, 1 GHz 2 Analog Plus 16 Digital Channels
MSOX3102A
Oscilloscope
1 GHz2 analog plus 16 digital channels Easily view your signals on the 8.5-inch WVGA display Capture more data with up to 4 Mpts memory See more signal detail with 1,000,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add memory, 20 MHz arbitrary waveform generator, 3-digit voltmeter, serial trigger and analysis, segmented memory & mask testing at any time
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Product
Mixed Signal Oscilloscope - 350 MHz, 4 Analog Plus 16 Digital Channels
MSOX3034T
Oscilloscope
350 MHz4 analog plus 16 digital channels Easily view and analyze your signals with on the large 8.5-inch capacitive touch screen Isolate signals in seconds with exclusive Zone touch triggering See more signal detail with the 1,000,000 wfms/s update rate Capture more data with up to 4 Mpts memory Expand your measurement capabilities with full upgradability: Add bandwidth, 20 MHz arbitrary waveform generator, 3-digit voltmeter, serial trigger and analysis & mask testing at any time
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Product
Lithography
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EVG’s key competencies in lithographic technology lie in the high-throughput contact and proximity exposure capabilities of its mask aligners and its newly developed, revolutionary and highly versatile maskless exposure lithography systems. These capabilities are complemented by its resist coating and resist development systems with advanced in-house process competences and hands-on development skills.
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Product
Mixed Signal Oscilloscope - 200 MHz, 4 Analog Plus 16 Digital Channels
MSOX4024A
Oscilloscope
200 MHz4 analog plus 16 digital channels Easily view signals on the large 12.1-inch capacitive touch screen Isolate signals in seconds with exclusive Zone touch triggering Capture more data with 4 Mpts memory and standard segmented memory See more signal detail with 1,000,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add bandwidth, dual-ch 20 MHz arbitrary Wave Gen, 3-digit DVM, serial trigger and analysis & mask testing at any time
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Product
Reticle/Mask Particle Remover
RP-1
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The RP-1 automatically removes particles from the reticle/mask by air (or N2) and vacuum suction. Routinely removing the particles before the lithography process extends the replacement cycle of the pellicle and cleaning cycle of the mask, thereby contributing to a reduction in running costs.
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Product
500 MHz 4 Channels Oscilloscope
DSOX3054A
Oscilloscope
500 MHz4 analog channels Easily view your signals on the 8.5-inch WVGA display Capture more data with up to 4 Mpts memory See more signal detail with 1,000,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add bandwidth, memory, digital channels, 20 MHz arbitrary waveform generator, 3-digit voltmeter, serial trigger and analysis, segmented memory & mask testing at any time
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Product
Respirator Fit Testers
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Respirators and masks play a crucial role in protecting workers from various airborne hazards, including environmental and chemical dangers, as well as airborne biohazards, in the workplace.
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Product
PXIe 1 GHz Oscilloscope
M9243A
Oscilloscope
1 GHz bandwidth oscilloscope2 analog channels5 GSa/s sample rate1,000,000 wfms/s update rate Isolate signals in seconds with exclusive zone triggering Additional options: 20 MHz arbitrary waveform generator, 3-digit voltmeter, serial trigger and analysis and mask testing
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Product
RF Analyzer
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Occupied Bandwidth (OBW)Adjacent Channel Power (ACP)Channel Power (CHP)Complementary Cumulative Density Function (CCDF) Intermodulation (IMD)Spectrum Emission Mask (SEM) IQ (Waveform)Phase Noise
