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TEM Lamella Preparation And Volume Imaging Under Cryogenic Conditions
ZEISS Correlative Cryo Workflow
ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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Breakthrough compressors for the GDSII and MEBES formats
GDZip + MEZip
Recognizing the challenge to transfer, manipulate, and store the exponentially-increasing size of IC design files, Solution-Soft has developed gdzip and mezip, breakthrough compressors for the GDSII and MEBES formats used by the industry. The MEBES format is the most commonly used format for electron beam lithography and photomask production. The GDSII stream is the standard exchange format between the design world and the mask shops.
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Electron Beam Lithography System
Spot type Electron Beam Lithography System JBX-8100FS achieved high throughput, small footprint and electric power saving.
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Current Sensing Resistors: ACQ-200
TCS
These components are four-terminal. bus-bar, metal strip current shunts. Assembled using electron beam welding. These units can handle 15W of continuous power and a maximum current of 350A 90.1mohm). Also they can absorb a high pulse power rating and have very low inductance. They also feature excellent long term stability, less than 100ppm/C TCR, and have excellent frequency characteristics.
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Magnetic Field Cancelling System
MR-3
3-axis magnetic field cancelling system for electron microscopes (SEM and TEM), electron and ion beam experiments, nanotechnology, biomagnetic investigations, etc. High reliability through rugged analog design. No tedious programming, no chrashs. More than 1000 MR-3 systems sold worldwide.
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Focused Ion Beam Scanning Electron Microscopes
FIB-SEMs
Combine imaging and analytical performance of a high resolution field emission scanning electron microscope (FE-SEM) with the processing ability of a next-generation focused ion beam (FIB).
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X-Ray Systems
X-ray and radioactive devices developed by AET, are widely utilized for medical, industrial and research use. The Compact Pulse X-ray Source can accelerate electron beams in a high-gradient electric field, to produce X-rays. Dose Calibrators are utilized for radioactive examinations and treatments in the medical industry.
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PED Systems
Pulsed Electron Deposition
Is a process in which a pulsed (80-100 ns) high power electron beam (~1000 A, 15 kV) penetrates approximately 1 μm into the target resulting in a rapid evaporation of target material. The non-equilibrium heating of the target facilitates stoichiometric ablation of the target material. Under optimum conditions, the target stoichiometry is preserved in the deposited films. All solid state materials – metals, semiconductors and insulators, including those transparent to laser wavelengths in PLD – can be deposited as thin films with PED. By combining PLD and PED, the range of complex materials that can be prepared as thin films can be greatly enhanced.
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Electron Probe Microanalyzer
EPMA-8050G
This instrument is equipped with a cutting-edge FE electron optical system, which provides unprecedented spatial resolution under all beam current conditions, from SEM observation conditions up to 1 μA order. Integration with high performance X-ray spectrometers that Shimadzu has fostered through the company's traditions achieves the ultimate advance in analysis performance.
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Microscopy Software/Hardware
ZEISS Atlas 5
Atlas 5 is your powerful hardware and software package that extends the capacity of your ZEISS scanning electron microscopes (SEM) and ZEISS focused ion beam SEMs (FIB-SEM). Use its efficient navigation and correlation of images from any source, e.g. light- and X-ray microscopes. Take full advantage of high throughput and automated large area imaging. Unique workflows help you to gain a deeper understanding of your sample.
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A Highly Versatile R&D Bell Jar Thin Film Coating System.
MODEL VES-3000
TEK-VAC's VES-3000 coater station model offers a modular concept for thin film deposition. Common PVD techniques which can be employed in this compact unit include thermal and electron beam evaporation. A 2KVA SCR controlled filament evaporation power supply is provided. Optional ion deposition and magnetron sputtering devices can be incorporated in the system.
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Space Flight Components
A tec, Inc. specializes in the design, manufacture, and integration of complex test systems and quality critical components. Our production engineering expertise separates us from other manufacturing companies when both reliability and cost are important. Atec has the best in 5 to 9 Axis CNC machining, coordinate measuring machines (CMMs), 3D additive metal and plastic printers, 9-Axis capable waterjet, cryogenic liquid flow test benches and environmental test chambers. We can deliver to the tightest tolerances and most exacting requirements. We can advise our customers on electron beam welding, friction joining, electronic test, environmental test, acoustics, vibration and many other technologies that can reduce manufacturing and operating costs. We are currently manufacturing liquid rocket engine fuel and oxidizer valves for multiple launch vehicles and have participated in 158 consecutive launch successes. Atec manufactured and tested advanced lithium-ion battery adapter plates that manage power for the International Space Station. Atec is designing, manufacturing, and testing power flow modules that work to prevent system failure on the human crew capsule (CCTS) that will transport astronauts to/from the ISS. Atec was awarded NASA Agency-Level Small Business Subcontractor of the Year , SBA Region VI Subcontractor of the Year for our support to NASA and Boeing and we were named a DCMA Top 500 Supplier.
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Light Sources
The unique dual-output of equivalent beams make it a useful source for many comparative applications in addition to wavelength calibration and so on. The two output beams originate from two views of the single emitting spot where the electron beam from the single hairpin filament collides with the interchangeable anode.
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Scanning Electron Microscopes
SEM
Scanning Electron Microscopes (SEM) scan a sample with a focused electron beam and obtain images with information about the samples’ topography and composition.
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Streak Tubes
Streak tubes are the most important modules of streak cameras used for the study of ultra fast optical phenomena. The latter cameras are tools of critical importance in many areas of science and technology like studies of plasma/electric discharge/ combustion/laser ablation/ condensed matter phenomenon, in optical communications, electron beam acceleration technology, photochemistry, medicine, biology etc. Streak cameras have made possible a series of important scientific discoveries in earlier mentioned areas of science and technology. Precision information about parameters of streak tubes is needed both by manufacturer of such tubes in improve tube design and by users of these tubes to correct data generated by the tubes and make possible more accurate interpretation of output images.
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XRT Source Brighthawk
The BRIGHTHAWK NT100 is a performance-leading microfocus X-ray tube comprising proprietary technology to achieve a high brightness output. The tube consists of a LaB6 crystal source for generation of the electron beam, a magnetic beam steering system, and a tungsten target for X-ray photon emission. The components are mounted in a precision-engineering housing and held at ultra-low vacuum levels for long-life performance. Following on from the successful 3rd generation tube, this 4th generation of tube across a wide energy range from 30 kV to 160 kV is highly configurable through a software interface to the internal control board, which is connected via an optical interface (through an Ethernet converter).
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Hi Rate Multi-Pixel Detection
Systems utilizing multiple electron beams are an emerging semiconductor metrology technology that aims to increase throughput. El-Mul is a pioneer in developing detection solutions for such metrology systems and has designed and manufactured prototype detectors that can simultaneously detect 144 beams at 35MHz.
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Electron Spectrometers
SPECS Surface Nano Analysis GmbH
Nanotechnology is focused on the engineering and the physical properties of small structures. Therefore techniques that have sensitivities at a scale of 0.1 nm to 100 nm are required to study these structures. Different methods of electron spectroscopy (XPS, UPS and AES) have a sensitivity in this range and are therefore key techniques in nanoscience.Thanks to our high level of expertise in electron optics and electronics we can offer electron spectrometers with the highest resolution and transmission possible.
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Scanning Electron Microscopy
SEM
Materials Evaluation and Engineering
JEOL JSM-6610 LV LaboratoryScanning electron microscopy (SEM) uses electrons for imaging to obtain higher magnifications and greater depth of field than light microscopes. The instruments at MEE are capable of variable-pressure, or low vacuum, SEM (VPSEM), as well as traditional high-vacuum conditions for sample observation. VPSEM is a specialized method using a variable-pressure sample chamber that allows direct evaluation of samples that are not readily examined with a traditional high-vacuum SEM. Nonconductive or vacuum sensitive samples that would typically require additional sample preparation can be directly analyzed in VPSEM without the need for additional sample preparation, such as carbon or metallic conductive coatings. This reduces both sample preparation time and distractions in microanalysis. Our laboratory also has a field emission SEM (FESEM) for critical high-magnification work and low-voltage (LVSEM) applications. Each instrument has a spacious sample chamber that can accommodate large and irregularly-shaped specimens and accessories for feature dimensional analysis and chemical microanalysis.
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Beam Probes
The CO2 Laser Beam Probes are hand-held plates designed to simplify the alignment of IR optical systems. They display the laser beam as a dark image on a fluorescent background using the same UV-excited, thermal-sensitive surfaces developed for Macken Instruments'' Thermal Image Plates.
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Scanning Electron Microscope
Verios G4 XHR SEM
The Thermo Scientific™ Verios G4 scanning electron microscope (SEM) provides sub-nanometer resolution from 1 to 30 kV and enhanced contrast needed for precise measurements on materials in advanced semiconductor manufacturing and materials science applications, without compromising the high throughput, analytical capabilities, sample flexibility and ease of traditional Scanning Electron Microscope (SEM).
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Electron Microscope Analyzer
QUANTAX EDS for SEM
Bruker's latest generation of QUANTAX EDS features the XFlash® 7 detector series, which provides the largest solid angle for X-ray collection (also called collection angle) and the highest throughput.
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Electron Microscope Analyzer
QUANTAX FlatQUAD
QUANTAX FlatQUAD is the EDS microanalysis system based on the revolutionary XFlash® FlatQUAD. This annular four-channel silicon drift detector is inserted between SEM pole piece and sample, achieving maximum solid angle in EDS.
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Beam Bender
10707A
The Keysight 10707A bends the incoming beam at a 90-degree angle and is designed for beam diameters of 6 mm or less . Includes a housing for standard mounting.
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Electron Microscope Analyzer
QUANTAX Micro-XRF
Micro-X-ray Fluorescence (Micro- XRF) spectroscopy analysis is a complementary non-destructive analytical technique to traditional Energy Dispersive Spectroscopy (EDS) analysis using a Scanning Electron Microscope (SEM).
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Ion Beam Deposition
Create ultra-precise, high-purity, thin film layer devices with maximum uniformity and repeatability with Ion Beam Deposition (IBD) Systems.
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Auger Electron Spectroscopy (AES)
Rocky Mountain Laboratories, Inc.
Auger Analysis, Auger Electron Spectroscopy (AES or Auger) is a chemical surface analysis method. AES measures the chemical composition of the outermost 100 Å of a sample. Measurements can be made at greater depths by ion sputter etching to remove surface layers.
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Expanded Beam Connectors
Amphenol Fiber Systems International
Expanded Beam uses a lens in front of the fiber to collimate the light coming out of the fiber. The lens expands the size of the beam from 9 um to 285 um for SM. Expanded Beam connectors have distinct advantages and disadvantages compared to Physical Contact connectors. Read our White Paper on Expanded Beam Connectors for more in-depth details.
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Linear Electron Accelerators Where Electrons Reach Energy Of Up To 10 MegaWatt
*Processing polymer materials and modifying their parameters*Processing semiconductor materials and devices*For treating food products for disinfection, eliminated bugs, pathogens, and micro-organisms, and increasing their shelf life*Processing diamonds, precious stones and semi-precious stones to change their color
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EQE/Photon-Electron Conversion Testing
Enlitech offers different solutions for incident photon-electron conversion testing systems. The available systems include IPCE, PV External quantum efficiency (PV-EQE), Internal Quantum Efficiency, Spectral Response (SR), Highly-sensitive EL-EQE. There are over 1,000 SCI papers cited Enlitech‘s systems to provide reliable experimental data for significant scientific publication. The Highest PV-EQE sensitivity and EL-EQE both reach 10-5 % (7 orders). They can be utilized to PV conversion efficiency, HJT/ PERC/TOP-CON current-loss analysis, Organic PV charge-transfer-state and Perovskite PV trap state measuring, and Organic PV and Perovskite PV Voc loss analysis.
