Vapor Deposition
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Matrix Vapor Deposition System
iMLayer
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The iMLayer matrix vapor deposition system is sample pretreatment (application of matrix) in order to perform MALDI-MS imaging using an analysis system such as the iMScope imaging mass microscope or the MALDI-7090. With the iMLayer, the deposition method has been adopted as a pretreatment method to achieve high spatial resolution. By using this method, fine matrix crystal can be produced. Also, thanks to automated control, the coating thickness is reproducibly controlled as users configure.
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MOCVD Systems
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For growing high-quality compound semiconductor films, few techniques match the precision of Metal-Organic Chemical Vapor Deposition (MOCVD). They give engineers tight control over film composition and thickness, making them essential for optoelectronics and advanced power transistors.
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Physical Vapor Deposition Systems
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Physical Vapor Deposition (PVD) systems use physical processes, like sputtering and evaporation, to deposit thin films with exceptional purity and control. These techniques are widely used in semiconductor manufacturing, optical coatings and protective applications.
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Ceramic Process Carrier Pallets
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Ceramic engineering specializing in Silicon Carbide, Boron Carbide, Alumina, Zirconia and Lead Zirconate Titanate (PZT) based ceramics, composites and thin films for High Strength, high temperature, semiconductive ceramic designed for use in wafer fabrication or hybrid circuits in vapor deposite ovens. Test Electronics will precision drill and customize pallets for your circuit board. Click on the Quote tab on the left then click on the Carrier Pallets tab to get an instant quotation on your process carrier pallets.
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Dynamic Ultra Micro Hardness Tester
DUH-210/DUH-210S
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A new evaluation system for measuring the material strength of micro regions, such as semiconductors, LSI, ceramics, hard disks, vapor deposited films, and thin coating layers, not addressed by previous hardness testers. It can also be used to evaluate the hardness of plastics and rubbers. This instrument uniquely measures dynamic indentation depth, not the indentation after the test. This in turn permits measurement of very thin films and surface (treatment) layers that are impossible to measure with conventional methods. Additionally, this same method supplies the data needed to calculate elastic modulus on the test specimens.
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Ozone Gas Generators
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SEMOZON® Ozone gas generators and subsystems are the industry standard for compact, high concentration, ultra-clean ozone gas generation. Applications include Atomic Layer Deposition (ALD), Atomic Layer Etch (ALE), Chemical Vapor Deposition (CVD) and Wet Cleaning.
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Deposition Systems
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When a thin film requires the most stringent structural or compositional properties consistently across every layer, Veeco’s Ion Beam Deposition (IBD) technology is often the answer. Using a focused beam of ions to sputter material from a target, this physical vapor deposition technique builds dense, uniform films with standout adhesion and stability.
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EpiStride SiC CVD System
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Veeco’s latest technology for the compound semiconductor market enables high-performance chemical vapor deposition of Silicon Carbide for both 6 and 8-inch wafer production. The platform enables a return to production in under 5 hours after routine cleaning maintenance. The EpiStride system’s high uptimes, short cycle times and overall stable performance lead to the lowest cost of ownership per wafer compared to competitive systems.
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ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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High Temperature Absolute Pressure Transducers
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Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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Ozone Gas Delivery Systems
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MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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Gas and Vapor Delivery Systems
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In thin film deposition, high-quality results start with how process gases are delivered, as they help create the stable environment needed for consistency by controlling flow, pressure and composition to support processes like ALD, CVD, and PVD. Advanced semiconductor devices developed for the most advanced computing processes, such as AI and edge computing, need the ultra-high-purity environments of our gas and vapor deposition delivery systems.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
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The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Vapor Concentration Monitor
IR-300 Series
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Metal-Organic Chemical Vapor Deposition (MOCVD) is widely used in the manufacture of LEDs, optical devices and other components. Liquid and solid precursors are delivered to the reaction chamber by controlling the temperature, pressure and the carrier gas flow rate (bubbling method). Process results can be affected by changes especially in temperature and liquid level. The in-line IR-300 Series measures and reports the precursor concentration in real time.
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Vapor Tension Thermometer
RF60A
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UEi Test & Measurement Instruments
Farenheit and Celsius scale Vapor Tension thermometer
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Atomic Layer Deposition Systems
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Atomic Layer Deposition (ALD) is a powerful way to build ultra-thin, super-precise coatings, one atomic layer at a time. It’s especially useful and efficient when working with tiny, complex 3D structures, making it a go-to technique in advanced semiconductor manufacturing.
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Duct Deposit Measuring System
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The Elcometer 456 Duct Deposit Measuring System has been specifically designed to meet the requirements of the DTT (Deposit Thickness Test) in HVCA’s (Heating & Ventilation Contractor’s Association) Guide to Good Practice, for the measurement of dust and grease deposits within ventilation systems and kitchen ducts made of ferrous metals.
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Water Vapor Absorption Tester
DRK854A
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Shandong Drick Instruments Co., Ltd.
Used to test the water vapor absorption performance of the sample.
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Product
Heat, Vapor, and Carbon-Dioxide Flux Sensors
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Heat, vapor, and carbon-dioxide flux sensors are typically used in eddy-covariance systems to measure exchanges of carbon dioxide, water vapor, and heat between the surface of the earth and the atmosphere.
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Mixed Injection System Liquid Vaporizer
MV-2000
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The MV-2000 achieves stable vaporization, even at low temperatures, using the new tornado flow method. This is suitable for vaporization a range of liquids even challenging sources such as "High-k", a liquid source which is pyrolyzed easily.
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Water Vapor Desorption Products
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RBD's vacuum chamber water vapor removal products include high-power, high temperature IR radiant bakeout emitters, and low-power, low temperature UVC emitters.
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Vapor Sorption Analysis
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Vapor Sorption Analysis is a technique in which a sample is subjected to varying conditions of humidity and temperature, and the response of the sample is measured gravimetrically. Understanding the effects of water content on structure and properties is critical in the development, processing and end use of a broad spectrum of materials. TA Instruments offers the most sensitive, versatile, and productive moisture sorption analyzers on the market. The Discovery SA combines a high-sensitivity thermobalance, innovative humidity control chamber, and reliable autosampler. Innovative technology combined with our unparalleled reputation for service and support make TA Instruments the clear choice of scientists worldwide for vapor sorption studies.
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Mixed Injection System Liquid Vaporizers
MI-1000/MV-1000
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This mixed injection system can rapidly vaporize a wide variety of liquid sources by using the gas-liquid mixture vaporization method. This method allows for the stable vaporization of high boiling point liquids.
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Cold Vapor Atomic Fluorescence (CVAF) Mercury Analyzer
QuickTrace M‑8000
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The QuickTrace® M-8000 Cold Vapor Atomic Fluorescence (CVAF) mercury analyzer is ideal for ultra-trace to sub-mg/L mercury quantitation. Due to the high sensitivity of the M-8000, it easily achieves the ultra-trace detection limit of <0.05 ng/L total mercury that is demanded by customers following EPA method 1631. The QuickTrace® M-8000 is also versatile enough to analyze samples >400 µg/L without dilution in a research or industrial setting.
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Cold Vapor Atomic Absorption (CVAA) Mercury Analyzer
QuickTrace M‑7600
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The QuickTrace® M-7600 Cold Vapor Atomic Absorption (CVAA) Mercury Analyzer easily achieves the ultra-trace mercury detection limit of <0.5 ng/L. The QuickTrace® M-7600 is ideal for ultra-trace to sub-mg/L mercury quantitation. The M-7600 is designed for routine and research use in a variety of settings, including environmental laboratories, industry, and research institutes, for virtually any aqueous acidified sample.
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Water Vapor Permeability Tester
QT-WVP
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Qualitest Water Vapor Permeability Tester QT-WVP series is used to test the water vapor transmission rate (WVTR) of packaging materials.
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Water Vapor Transmission Rate WVTR Tester
WPT Series
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Water Vapor Permeability Tester is based on the Gravimetric method and is applicable to the water vapour transmission rate (WVTR) test of plastic films, composite films, sheets and other materials.
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Parylene Deposition Equipment
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SCS offers Parylene deposition systems that range from a portable laboratory unit to production models for high-volume manufacturing applications. SCS Parylene deposition systems are designed for accurate and repeatable operation, featuring closed-loop monomer pressure control, which ensures deposition of the polymer film at a precise rate. Whether researching new coating applications or developing structures out of Parylene in the laboratory, or coating components in a production environment, SCS leads the industry with its state-of-the-art Parylene deposition systems.
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CVAF – Cold Vapor Atomic Fluorescence
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Cold Vapor Atomic Fluorescence (CVAF) is a powerful technique based on detecting fluorescence light emitted by the sample. Below the principle of the technique is explained in a nutshell.
