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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Ultraviolet Light Distribution Measurement Film
UVSCALE
UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Ultraviolet Microscope
UVM-1
The UVM-1™ is a UV microscope that also can image in the visible and NIR. This UV-visible-NIR microscope embodies both advanced optics for cutting edge UV, color and NIR imaging and visualization. The system is a flexible design, very easy to use and very durable. It is designed with cutting edge CRAIC optics for the highest image quality and to give years of service.
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Solar Ultraviolet Pyranometers
UVR1-T, UVR1-A, &
The Middleton Solar UVR1 series are precision filter radiometers for measuring solar global ultraviolet irradiance. The UVR1-T and UVR1-A are suitable for air pollution monitoring. The UVR1-B is suitable for biological and human erythema (sunburn) monitoring.
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Deep Ultraviolet Spectrophotometer System
VUVAS-10X
A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
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Deep Ultraviolet Observation System for Microscope
U-UVF248
Model Capable of High-magnification/High-contrast Deep Ultraviolet (DUV) Observation. A Semiconductor / FPD Inspection Microscopes.
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Light Sources
These external units provide illumination which is transmitted to the viewing instrument by a light guide cable, and then through the scope via the integral fiber bundle to the viewing tip.
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Light Source
LS-HA
provides the stable and smooth wide-band spectral output. It’s proper for most visible to near infrared range measurement. This light source is also designed to be used in the standard measurement package. It ‘s a simple and quick measurement platform.
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Light Curtains
Leuze electronic GmbH + Co. KG
Switching light curtains are perfect for monitoring large measurement fields. They react as soon as anything or anyone penetrates this field. Their fast configuration and simple handling save time and money compared to imaging processes. Thanks to different beam spacings and measurement field lengths, switching light curtains can be used to solve a range of application problems.
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Light Meters
LXP-2
The digital light meter is a precision instrument used to measure illuminance (Lux, footcandle) in the field. It is meet CIE photopic spectral response. It is fully cosine corrected for the angular incidence of light. The illuminance meter is compact, tough and easy to handle owing to its construction. The light sensitive component used in the meter is a very stable, long-life silicon photo diode and spectral response filter.
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Light Source
pE-300ultra
CoolLED's pE-300ultrais a fluorescence microscopy light source which offers intense, broad-spectrum LED illumination for imaging most common fluorescent stains. Users have access to both microsecond switching via multiple TTL inputs and the ability to mount inline excitation filters. This, when paired with today's high performance multi band filter sets, facilitates imaging traditionally done via a white light source and a filter wheel, with all the benefits of LED.
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PCE-2000UV Ultraviolet LED/Module Radiation Measurement System
Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV Ultraviolet LED/Module Radiation Measurement System can realize the measurement of the relative spectral power distribution of ultraviolet LED, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and total radiation flux in specific wavelength.
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Ultraviolet Meter
UVR Series
UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Extremely Accelerated Stress Test Chambers
The extremely accelerated stress environment is defined by high temperature, high humidity and high pressure. WEIBER provides humidity resistance evaluation test for electronics components through customized Extremely Accelerated Stress Test Chamber. This chamber provides high performance test in minimal amount of time according to international IEC 60068-2-66 standard. This chamber also known as Accelerated Stress Test Chamber, Halt and Hass Test Chamber, Halt Test Chamber and Hass Test Chamber.This chamber reduces the time taken for humidity testing in electronic components. 2 types of tests saturated and unsaturated extremely accelerated stress test can be performed. In saturated test the temperature is maintained at 1210C at 100%RH, and for unsaturated temperature of 110, 120, 1300C is maintained at 85%RH. Normally for electronic components unsaturated type test is done.
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Lighting Maintenance
Lumen maintenance is the most useful gauge to determine the lifetime or useful light output rating of an LED light source.
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Light Meters
A light meter is a very sensitive electronic measuring device used to help monitor the illumination of any given area. Most light meter devices are small in size, simple to operate and equipped with an easy-to-read lighted screen made of special glass. Typically, a heavy-duty housing protects the light sensor inside the light meter from damage. A light meter is used for measuring brightness in lux (lx), foot candle (fc) or candela per square meter (cd/m²)measuring units. Some light meter devices are equipped with an internal memory or data logger to record and save measurements. The measurement of light intensity with a light meter is becoming increasingly important in the workplace due to safety concerns. Light measurement is also necessary to determine the best location and angle when installing and adjusting solar panels.
