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Scanning Electron Microscopy
surface imaging from 1 to 5 nm in size.
See Also: Scanning Electron Microscopes, SEM
- Kreon Technologies
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Scanning Electron Microscopy
SEM
Materials Evaluation and Engineering
JEOL JSM-6610 LV LaboratoryScanning electron microscopy (SEM) uses electrons for imaging to obtain higher magnifications and greater depth of field than light microscopes. The instruments at MEE are capable of variable-pressure, or low vacuum, SEM (VPSEM), as well as traditional high-vacuum conditions for sample observation. VPSEM is a specialized method using a variable-pressure sample chamber that allows direct evaluation of samples that are not readily examined with a traditional high-vacuum SEM. Nonconductive or vacuum sensitive samples that would typically require additional sample preparation can be directly analyzed in VPSEM without the need for additional sample preparation, such as carbon or metallic conductive coatings. This reduces both sample preparation time and distractions in microanalysis. Our laboratory also has a field emission SEM (FESEM) for critical high-magnification work and low-voltage (LVSEM) applications. Each instrument has a spacious sample chamber that can accommodate large and irregularly-shaped specimens and accessories for feature dimensional analysis and chemical microanalysis.
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Scanning Electron Microscopy (SEM Analysis)
Rocky Mountain Laboratories, Inc.
Scanning Electron Microscopy (SEM Analysis) can produce images of almost any sample at magnifications of 15-300,000X. The SEM has tremendous depth of field allowing for imaging that cannot be accomplished using optical microscopy. Conductive and nonconductive samples can be imaged. When operated in the backscatter (BSE) detection mode, differences in material composition can be observed. Elemental analysis can be performed on any feature observed with an integrated Energy Dispersive Spectroscopy (EDS) detector.
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Sputter Coater & Freeze Fracture Solutions
To obtain high-quality images of samples with scanning (SEM) or transmission electron microscopy (TEM), your samples need to be conductive to avoid charging. If a sample does not have a high enough conductivity, then you can quickly cover it with a conductive layer using the method of sputter coating. Also, a carbon or e-beam evaporator coating can be used. Such coatings protect the sample, allow enhancing of the EM image contrast, or can act as a TEM-grid support film for small scale samples.
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Microscopy
Microscopy is the technical field of using microscopes to view objects and areas of objects that cannot be seen with the naked eye. There are three well-known branches of microscopy: optical, electron, and scanning probe microscopy, along with the emerging field of X-ray microscopy.
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TEM Lamella Preparation And Volume Imaging Under Cryogenic Conditions
ZEISS Correlative Cryo Workflow
ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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X-Ray Photoelectron Spectrometer
AXIS Supra
AXIS SupraTM is an X-ray photoelectron spectrometer (XPS) with unrivalled automation and ease of use for materials surface characterisation. The patented AXIS technology ensures high electron collection efficiency in spectroscopy mode and low aberrations at high magnifications in parallel imaging mode. XPS spectroscopy and imaging results can be complemented by additional surface analysis techniques such as: ultraviolet photoemission spectroscopy (UPS); Schottky field emission scanning Auger microscopy (SAM) and secondary electron microscopy (SEM) and ion scattering spectroscopy (ISS). The AXIS Supra replaces the AXIS Ultra DLD as Kratos' flagship x-ray photoelectron spectrometer.
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Analytical Services
IGC: Inverse Gas Chromatography; Understand surface energies, polarities, acid/base properties and nanomorphology on powders and fibers. ToF-SIMS: Time-of-Flight Secondary Ion Mass Spectrometry. Localize your molecules at the first nanos! 2D imaging with resolution up to 200 nm. Highest sensitivity up to 10 ppm. CM: Quarz Crystal Microbalance In-situ observation of thickness and stiffness of any films in liquid environmentSEM: Scanning Electron Microscopy Images say more than words, especially with an artistic eye XPS/ESCA: X-ray Photoelectron Spectroscopy/Electron Spectroscopy for Chemical Analysis.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Cross Sections and Metallography
Rocky Mountain Laboratories, Inc.
Cross sections are prepared by mounting samples in epoxy and then grinding and polishing the mount for imaging in the optical microscope or Scanning Electron Microscopy (SEM). Valuable information from cross sectioning can include: film thicknesses, inclusions, corrosion thickness, dimensional verification, and subsurface defects. Metallographic cross sections are typically etched to reveal the microstructure. Microstructural analysis can provide information about heat treatment history, corrosion susceptibility, as well as undesirable microconstituents.
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Scanning Electron Microscope (SEM)
Prisma E
Prisma E scanning electron microscope (SEM) combines a wide array of imaging and analytical modalities with new advanced automation to offer the most complete solution of any instrument in its class. It is ideal for industrial R&D, quality control, and failure analysis applications that require high resolution, sample flexibility and an easy-to-use operator interface. Prisma E succeeds the highly successful Quanta SEM.
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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Scanning Electron Microscopes
Our Scanning Electron Microscopes (SEMs) resolve features from the optical regime down to the sub-nanometer length scale.
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Scanning Probe Microscopy
SPECS Surface Nano Analysis GmbH
As Scanning Probe Microscopy (SPM) is a key tool for nanotechnology, SPECS offers dedicated solutions for highly demanding requirements.In UHV, strong emphasis lies on spectroscopic methods such as scanning tunneling spectroscopy and inelastic tunneling spectroscopy as well as single atom and molecule manipulation. With the invention of a Joule-Thomson cryostat by Prof. Wulf Wulfhekel, SPECS now offers the JT-STM , operating sample and sensors in thermal equilibrium below 1K with optional high magnetic field.
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Scanning Electron Microscope
JSM-IT510
Scanning electron microscopes (SEMs) are indispensable tools not only for research but also for quality assurance and manufacturing sites.At those scenes, the same observation processes need to be performed repeatedly and there has been a need to improve the efficiency of the process.
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Light Microscopy
Materials Evaluation and Engineering
MEE has a variety of light microscopes with magnifications ranging from 5X to 2400X. Each microscope is connected to a camera with digital image capture for subsequent measurements and/or additional image analyses.
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Microscopy Software
Our modular software platforms enable you to acquire, process and analyze images in multiple dimensions and over various timepoints
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Electron Sources
SPECS Surface Nano Analysis GmbH
To our customers in research and industry we offer a variety of sources for deposition, excitation and charge neutralization as well as analyzers and monochromators. Most of our sources originate from product lines which we have taken over from Leybold AG, Cologne, and from VSI GmbH. The X-ray monochromator Focus 500 and the UV monochromator TMM 302 are original developments by SPECS.Compliance with industry standards, a good price-performance ratio, stability, and longevity are the guidelines for our product development. We focus on standardized easy handling, user-friendliness, standardized software interfaces and safety.
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Microscopy
Aurora is an award-winning Airy Beam Light Sheet imaging system designed for researchers working in fields such as neuroscience, developmental biology, cancer biology, regenerative medicine and other bioscience disciplines, including Plant Sciences and Marine Biology. Compact, affordable and customisable, Aurora is available as a single and multiphoton light sheet fluorescence microscope for rapid, large 3D volumetric imaging, high resolution, multicolour, time-lapse imaging and live cell imaging. Aurora uses ground-breaking Airy Beam Light Sheet imaging techniques to achieve outstanding results in the field. It is currently in use by many leading organisations delivering results previously not possible.
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Microscopy
Our microscopy systems business is focused on providing best-in-class performance within a modular architecture. We design and manufacture Andor products to integrate with our own and third-party software, and all leading microscopes, we also support high quality products from other manufacturers.
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X-ray Microscopy
ZEISS Xradia Versa
Extremely versatile ZEISS Xradia Versa 3D X-ray microscopes (XRM) provide superior 3D image quality and data for a wide range of materials and working environments. Xradia Versa XRM feature dual-stage magnification based on synchrotron-caliber optics and revolutionary RaaD™ (Resolution at a Distance) technology for high resolution even at large working distances, a vast improvement over traditional micro-computed tomography. Non-destructive imaging preserves and extends the use of your valuable sample, enabling 4D and in situ studies.
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Electron Microscope Analyzer
QUANTAX EDS for TEM
Long standing expertise in EDS ensures the configuration of the best solution for your specific microscope (STEM, TEM or SEM) thanks to slim-line detector design and geometrical optimization for each microscope pole piece and EDS flange type
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Electron Microscope Analyzer
QUANTAX EBSD
QUANTAX EBSD system, with its popular OPTIMUS 2 detector head, is the best available solution for analyzing nanomaterials in the SEM
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Electron Microscope Analyzers
Bruker’s electron microscope analyzers EDS, WDS, EBSD and Micro-XRF on SEM offer the most comprehensive compositional and structural analysis of materials available today. The full integration of all these techniques into the ESPRIT software allows you to easily combine data obtained by these complementary methods for best results.
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Nanoscale Microscopy Standards
The nanoscale AFM-CD standard (CD, critical dimension) contains structures to calibrate line widths and periods of AFM (atomic force microscopy) devices.
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Ion & Electron Detection
Photonis is the global leader in the development and manufacturing of detectors and optical components to detect ions and electrons. These detectors and components have been designed for a wide range of scientific instruments used in space and research projects but also in cells and material analysis in lifescience or non destructive testing.
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Radiation Scanning Equipment
The spectrometer is designed for radiation scanning of territories and objects. The functions of the spectrometer are measurement of the energy distribution of gamma radiation, measurement of the ambient dose equivalent rate of gamma radiation, search and identification of gamma-emitting radionuclides, detection of neutron radiation sources.
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EQE/Photon-Electron Conversion Testing
Enlitech offers different solutions for incident photon-electron conversion testing systems. The available systems include IPCE, PV External quantum efficiency (PV-EQE), Internal Quantum Efficiency, Spectral Response (SR), Highly-sensitive EL-EQE. There are over 1,000 SCI papers cited Enlitech‘s systems to provide reliable experimental data for significant scientific publication. The Highest PV-EQE sensitivity and EL-EQE both reach 10-5 % (7 orders). They can be utilized to PV conversion efficiency, HJT/ PERC/TOP-CON current-loss analysis, Organic PV charge-transfer-state and Perovskite PV trap state measuring, and Organic PV and Perovskite PV Voc loss analysis.
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Scanning Instruments
X-Rite scanning solutions automate press-side color control and are ideal for printers and converters who want to benefit from fast, accurate color. These systems not only remove the possibility of human error, they speed up make-ready and generate predictable and repeatable color results.
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Long Range Scanning
Our contract measurement services include a variety of short-range (< 20 feet) and long-range (20 to 900 feet) high definition technologies, which use both contact and non-contact processes. With over a decade of experience in long range scanner technologies, we have the experience to determine the most affordable approach to your project and the expertise to do the job right. Our tools for long range scanner services include portable CMMs (PCMM) – both touch probes and laser trackers – and 3D laser mapping scanners.
