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Thin Film
layer of material ranging < a nanometer to > a micrometer in thickness.
See Also: Film, Ellipsometers
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Thin Film Analyser
TFA
The TFA instrument has be designed to monitor dissolution rates with a minimal volume of developer, typically ≤ 1 ml. The design uses surface tension to hold the developer in a small gap between the sample and the detector head. The instrument allows multiple measurements on the same sample. Thickness measurement can be made in the same geometry as dissolution measurements.
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Thin Film Lithium Tantalate (TFLT™) Pyroelectric Detectors
For room temperature measurement of THz sources, from nW to mW.
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Thin Film
Substrates: ceramics, glass, soft substrates. Conductor: Au, Pt, Pd, Ni, Cu, Ta, WTi. Dielectrics: Polyimide, SiN. Micro strip and coplanar design. Through hole metallisation, filled via. Integrated resistor and capacitor. Air bridges. Polyimide Multilayer.
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Thin Film Metrology Systems
Gemini Series
The n&k Gemini-TF, Gemini-TF-M and Gemini-FPD are specifically designed for measurements of patterned and unpatterned films on transparent or opaque substrates. These tools are used extensively for solar cell, flat panel and photomask applications. The tools belonging to the Gemini-TF Series are based on unpolarized Reflectance (R) and unpolarized Transmittance (T) measurements, with a 50μm spot size for both R and T. R and T are simultaneously measured to determine film thickness and n and k spectra from 190nm – 1000nm
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Scatterometers / Thin film Metrology Systems
Olympian Series
DUV-Vis-IR (Wavelength Range: 190nm – 15,000nm) Scatterometers / Thin Film Metrology Systems: The n&k Olympian, n&k Olympian-450 and n&k Olympian-M are DUV-Vis-IR scatterometers/thin film metrology systems with micro-spot technology, covering the wavelength range from 190nm – 15,000nm. With the inclusion of the infra-red wavelength range, the Olympian Series extends the capabilities of n&k’s DUV-Vis-NIR scatterometer series – the OptiPrime-CD Series.
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Thin Film/Metal Film Chip SMD Chip Resistors
Panasonic Industrial Devices Sales Company of America
Panasonic’s industry leading Thin-Film Chip Resistors features include high reliability at high temperature and high humidity as well as high accuracy, low current noise and excellent linearity. Panasonic’s High Precision Thin Film Resistors are designed for robust applications where long life is crucial in markets such as automotive, appliance or industrial. These Resistors boast a high accuracy of up to 10ppm, 0.05% making them one of the best-in-class Resistors on the market today. Panasonic Thin-Film Resistors are available in case sizes down to 0201. Compliant standards include: IEC 60115-8, JIS C 5201-8, and EIAJ RC-2133B. These Resistors are AEC-Q200 Certified.
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Thin Film SPY Inspection w/ Built In Jeep Meter
780
For thin film coatings the easy-carry and easy to handle SPY Model 780 speeds inspection time with its built in Jeep meter and various other time saving and comfort features.
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Compact Passive and Active Resistor Trimming for Thick and Thin Film
LRT 2000C
*Travel: 6" x 6"*Laser : Fiber Laser Ytterbium 1064 nm*Kerf: 30 to 80 micron Adjustable*Pulse width : 80 nano second*Rap Rate: 1 to 1 million Pulse Per Second*Average Power: 20 watts
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Thin Film Based Thermopile Detector: 1 Channel
DR46 Compensated
A one-channel compensated thin-film thermopile in a TO-8 package. The active area and compensating element area are 4mm x 0.6mm each. Offers high output with very good signal-to-noise ratio. Internal aperture minimizes channel-to-channel crosstalk increasing sensitivity.
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Thin Film Based Thermopile Detector: 2 or 1 Channels
DR46
A two-channel or a one-channel compensated thin-film thermopile in a TO-8 package. Each active area is 4mm x 0.6mm. Offers high output with excellent signal-to-noise ratio. An internal aperture minimizes channel-to-channel crosstalk increasing sensitivity.
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Thin Film Chip Resistors, High Stability and Reliability Type
ERA-XV/ERA-XK Series
Panasonic Industrial Devices Sales Company of America
Anti-Sulfurated Thin Film Chip Resistors From Panasonic For Dependable, Accurate And Reliable Performance In Extremely Hazardous EnvironmentsPanasonic's ERA-xV and ERA-xK Series Thin Film Chip Resistors feature a soft terminal and passivated layer. With a total of 2,889 part number variants, Panasonic ERA-xV and ERA-xK Series Resistors provide design engineers with a wide array of Resistors to choose from specifically developed to handle extremely hazardous and challenging application environments.
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Thin Film Based Thermopile Detector: 3 Channels, Compensated
T34 Compensated
A three-channel compensated (6 element) thin-film thermopile in a TO-8 package. Each active area is 3.16mm x 0.4mm. Offers thermal compensation to minimize effect of sudden ambient temperature change. Internal aperture minimizes channel-to-channel crosstalk while increasing sensitivity.
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Thin-Film Thickness Measurement Systems
The Filmetrics® range of affordable reflectometers deliver high-precision thin-film thickness measurements in seconds. These easy-to-use tools, combined with intelligent software and a broad range of accessories and configurations, provide maximum versatility in film thickness measurements ranging from 1nm to 3mm.
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Passive and Active Resistor Trimming for Thick and Thin Film
LRT 2000L
*Travel: 6" x 6"*Laser : Fiber Laser Ytterbium 1064 nm*Kerf: 30 to 80 micron Adjustable*Pulse width : 80 nano second*Rap Rate: 1 to 1 million Pulse Per Second*Average Power: 20 watts*Target: Electric crosshair on monitor
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Thin Film Chip Resistors, High Voltage Type
Panasonic Industrial Devices Sales Company of America
Thin Film Chip Resistors, High Voltage Type by Panasonic
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In-Situ Spectroscopic Ellipsometer for Real-Time Thin Film Monitoring
UVISEL Plus In-Situ
The UVISEL Plus in-situ spectroscopic ellipsometer can be easily mounted on process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for the real-time control of thin film deposition or etch processes.The UVISEL Plus in-situ provides the unique combinations of very high speed, sensitivity, dynamic range and accuracy making the instrument able to control deposition / etch at the atomic layer thickness level, even for rapid processes.
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Thin Film Design Software
Scientific Computing International
SCI offers software tools for optical thin film design, material analysis, ellipsometry, and spectrophotometry. SCI’s current standalone optical thin film software includes:
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Reference Ellipsometer for Thin Film Measurements
UVISEL Plus
The UVISEL Plus ellipsometer range offers the best combination of modularity and performance for advanced thin film, surface and interface characterization. FastAcq technology enables a sample measurement from 190 to 2100nm to be completed within 3 minutes, at high resolution. The possibility to continuously adjust the spectral resolution along the measurement range enables to scan a sample smarter and faster.
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Scatterometer with Thin Film Measurement Capabilities
OptiPrime-X Series
The n&k OptiPrime-X series are automated metrology systems used to fully characterize and monitor Thin Film and OCD applications for both current and next generation IC processes.
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Thin Film Composition and Thickness Monitor
P-1000
The Precision P-1000 readily analyzes compound thin films utilized in semiconductor, superconductor, magnetic and applications.
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Power Amplifiers
Power amplifiers are designed and manufactured by utilizing the most advanced PHEMT or MMIC devices, thin film technologies, and an improved DC power supply to deliver a high output power with superior power added efficiency (PAE) and high linearity. While standard models focus on general purpose applications, additional models with differing frequency ranges, gains and power levels are listed on the website. Custom designs are also offered to meet any user’s specific needs.
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Hybrid Amplifiers
Gain Block
Macom Technology Solutions Holdings Inc.
MACOM’s portfolio of hybrid amplifiers cover a frequency range of 10 kHz to 6 GHz. Each amplifier is designed to be unconditionally stable and have excellent cascadability. Our amplifiers are designed using thin film technology and are integrated components thindat include internal DC biasing circuitry, allowing them to maintain excellent electrical performance over the 55˚C to 100˚C range. Hermetically sealed and screened up to space level, these amplifiers are ideally suited for hi-reliability and mission critical applications.
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High Isolation 1310/1550nm WDM
HWD1315
Hangzhou Huatai Optic Tech. Co., Ltd.
HWD1315 high isolation WDM is based on mature thin film filtering tech, metal sealing technology package. HWD1315 is used in combination and separation of 1310nm and 1550nm band optical signal. Its wide bandwidth, flatness, low insertion loss and isolation are higher than the average MWDM devices and so on.
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2-MGEM Optical Anisotropy Factor Measurement System
The 2-MGEM Optical Anisotropy Factor Measurement System is a normal-incidence polarization reflection microscope designed to measure the sample Mueller matrix and is a 2008 R&D 100 Award Winner. This system is designed specifically to evaluate the Optical Anisotropy Factor (OPTAF) of cross sections of TRISO nuclear fuel pyrocarbon layers. Other possible material characterizations include measuring Mueller matrix elements of other crystals, carbon compounds, and thin film coatings (e.g. surfacedeposition films) at normal incidence. The 2-MGEM can also measure retardation (d), circular diattenuation (CD) and the polarization factor (ß). These parameters are not measurable using older techniques, since those techniques do not incorporate a compensating optical element.
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SMD/Chip Resistors
Panasonic Industrial Devices Sales Company of America
Panasonic offers a wide range of SMD/Chip Resistors including conventional Thick Film and Precision Thick Chip Resistors as well as specialized Resistors such as Thin Film, Metal Film Chip, Current Sense and more.
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Dynamic Ultra Micro Hardness Tester
DUH-210/DUH-210S
A new evaluation system for measuring the material strength of micro regions, such as semiconductors, LSI, ceramics, hard disks, vapor deposited films, and thin coating layers, not addressed by previous hardness testers. It can also be used to evaluate the hardness of plastics and rubbers. This instrument uniquely measures dynamic indentation depth, not the indentation after the test. This in turn permits measurement of very thin films and surface (treatment) layers that are impossible to measure with conventional methods. Additionally, this same method supplies the data needed to calculate elastic modulus on the test specimens.
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PLD Systems
Pulsed Laser Deposition
Is a versatile thin film deposition technique. A pulsed laser (~20 ns pulse width) rapidly evaporates a target material forming a thin film that retains target composition. This unique ability of stoichiometeric transfer of target composition into the film was realized first by the research team led by Dr. Venkatesan at Bell Communications Research, NJ, USA, nearly 30 years ago while depositing high temperature superconducting (YBa2Cu3O7) thin films. Since then, PLD has become the preferred deposition technique where ever thin films of complex material compositions are considered. Another unique feature of PLD is its ability for rapid prototyping of materials. The energy source (pulsed laser) being outside the deposition chamber, facilitates a large dynamic range of operating pressures (10-10 Torr to 500 Torr) during material synthesis. By controlling the deposition pressure and substrate temperature and using relatively small target sizes, a variety of atomically controlled nano-structures and interfaces can be prepared with unique functionalities.
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100GHz Single Fiber Bi-Direction Dense WDM
DWDM-1200
Hangzhou Huatai Optic Tech. Co., Ltd.
Huatai DWDM-1204, DWDM-1208 dense DWDM DWDM, which is based on mature thin film filtering technology, It has the feature of low insertion loss, high isolation and flexible channel configuration. It can bi-direction transmit 4 channel(1204) or 8 channel(1208) on one fiber up stream/down stream.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
