OAI
OAI is a leading manufacturer of reliable, precision equipment for MEMS, semiconductors, nanotechnology, cleanroom automation, and for UV light measurement.
- 800-843-8259
408-232-0600 - 408-433-9904
- sales@oainet.com
- 464 South Hillview Drive
Milpitas, CA 95035
United States of America
Categories
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Automated I-V/AOI/EL and Sorting System
OAI’s High Performance In-line Automated-I-V Testing, AOI/EL Inspection and Sorting/Binning System for Various Si Solar Cells. The 10000A-I-V System is a unique and reliable I-V testing, AOI/EL Inspection and Sorting / Binning system for testing of Mono, Multi-Si, C-HJT and other full Size (156mm x 156mm) and/or Cut-cell (156mm x 39mm or 156mm x 31.2mm or other custom sizes) Si Solar Cells.
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Large Substrate Mask Aligner
Model 6020
The Model 6020 is a large substrate Production Mask Aligner or Auto-flood Exposure System for RDL First Level Advanced Packaging (PLP) and markets requiring exposure of large glass panels. It is engineered with OAI’s precision, reliability, and quality that is found in all of OAI’s products. The features include wedge effect leveling, superb process repeatability, ≤ 2.0µm printing resolution, and remote diagnostics. Using robotic handling, the system can stand alone or be fully integrated with photo resist processing.
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Standard & Custom Test Fixtures
Both standard and custom Test Fixtures from OAI enable the user to integrate the solar cell with the I -V tester. Fixture configurations range from from simple hold down devices to temperature-controlled fixtures with front and back side contact. We invite you to contact an OAI Application Engineer for help with your fixture design. With our expert guidance, you can expect maximum performance from your I -V Tester and Solar Simulator.
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UV Meters
OAI’s UV Measurement Instrumentation are the standard for Semiconductor Lithography, MEMS, Sensors, Microfluidics, UV Curing, 3-D Printing, Sterilization, Water Purification and Solar/PVC industries. For over 45 years our meters have earned a reputation for accuracy, repeatability and dependability. We offer full calibration and support services worldwide.
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Exposure Systems
Model 2000AF & 2000SM
The OAI Model 2000 Exposure Systems may be configured as either an edge-bead exposure system (2000SM) or a flood exposure system (2000AF); both configurations are based on OAI’s proven, time-tested platform.
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Tabletop Front & Backside Mask Aligner
Model 200IR
The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative for R&D or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z-axis.
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Surface & Volume Resistivity Meter for Nonconductive Materials
Hiresta UX
The new Hiresta-UX is a high performance meter for measuring the surface and volume resistivity of a wide variety of nonconductive materials. With an extended measurement range of 103 ~ 1014Ω, this meter is ideal for Production, Engineering, R&D and Quality Control. The new Hiresta-UX features powerful new algorithms that automatically choose the right voltage, which optimizes the surface and volume resistivity testing. This versatile, high performance resistivity meter includes a built-in switch box that can be mated with a J-Box (meets JIS K 6911 for surface & volume resistivity and is compatible with ASTM D 257) as an option. The Hiresta-UX can store up to 2,000 measurement results, which can be easily exported to a USB memory device.
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Testing for Si Solar Cells Using High Performance CCD
EL Imaging Tester
EL Testing for Si Solar Cells using High Performance CCD. The determination of luminescence (photo emissions) in solar cells is an important characterization tool. Typical solar cells often have defects which limit the efficiency or lifetime of a cell. Many of these defects are visualized with Luminescence Imaging. By using this technique, the manufacturing process can be optimized to produce better cells. Luminescence Imaging takes advantage of the radiative inter-band recombination of excited charge carriers in solar cells. The emitted photons can be captured with a sensitive CCD camera to obtain an image of the distribution of the radiative recombination in the cell. This distribution is determined by the local excitation level, allowing the detection of electrical losses, thus mapping the diffusion length of minority carriers as the emitted light is low intensity and in the near infra-red range, the CCD camera has a high sensitivity wavelength from 900 to 1100 nm with little thermal noise. This CCD camera provides excellent resolution of 1024 x 1024 pixels with a large 1μm pixel size, multi-megahertz readout speed, and robust USB 2.0 connectivity. The EL CCD Camera is the ultimate high-performance CCD camera for electroluminescence and photoluminescence imaging for Photovoltaic (PV) Cells and Modules. This camera combines low noise electronics and optimal sensitivity in NIR.
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Exposure Systems
Model 2012AF & 2012SM
The Model 2012AF Flood Exposure System provides a cost-effective method for automated flood exposure. Designed to accommodate wafers from 8” to 300mm, the tool features automated FOUP loading. Mask and substrate changeover can be accomplished quickly and easily adding to both versatility and high-volume throughput of this production tool.The Model 2012SM Automated Edge-bead Exposure System provides a cost-effective method for edge-bead removal using standard shadow mask technology. Designed to accommodate wafers from 8” to 300mm, the tool features automated FOUP loading. Mask and substrate changeover can be accomplished quickly and easily adding to both versatility and high-volume throughput of this production tool.
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Calibrated Solar Reference Cell
To insure repeatable testing on any solar simulator, OAI offers 2cm x 2cm calibrated reference cells. Standard reference cell calibration cycles can be set up by OAI''s calibration laboratory to insure that your reference cell maintains certification.
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Single Long Pulse Solar Simulator & I-V Test System
TriSOL SLPSS
The OAI Test System for HIGH EFFICIENCY SOLAR CELLS overcomes the limitations of flash testing by providing a highly optimized pulse width and voltage sweep rate to match the cell’s dielectric response speed. As a result, the system produces extremely accurate measurements of solar cell efficiency leading to increased profitability.
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Calibration Services
For over 25 years, OAI (Optical Associate Inc.), is the leader in NIST traceable calibration of instruments for measuring Ultra Violet (UV) light. Originally designed to meet the demanding needs of the semiconductor wafer fabrication industry, OAI developed the most repeatable NIST traceable calibration in the industry.
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UV Light Meter
Model 308T
Built for high intensity applications the NEW OAI Model 308T UV Light Meter is a dependable, direct-reading instrument designed for measuring UV light intensity for UV curing. The Model 308T features detachable probes for use in the UVA, UVB and UVC ranges, plus a high speed serial port. Accuracy of the meter is within ±3%and measurement repeatability is within ±3 LSB (least significant bit). Like all OAI precision instruments, the Model 308T provides NIST traceable measurements. This easy-to-use meter is auto-ranging from 0.1 to 1999.9 milliwatts/cm2 full scale when used with the 2000 milliwatts/ cm2 probe. The linearity of the meter in this range is at least ±(.002% + 6 LSB).
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Automated Front & Backside Mask Aligner System
Model 6000
With over 4 decades of manufacturing in the semiconductor industry, OAI meets the growing challenge of a dynamic market with an elite class of production photolithography equipment. Built on the proven OAI modular platform, the Model 6000 has front and backside alignment that is fully automated with a submicron printing capability as well as submicron top to bottom front side alignment accuracy which delivers performance that is unmatched at any price. Choose either topside or optional backside alignment which uses OAI’s customized advanced recognition pattern software. These Mask Aligners have OAI’s Advanced Beam Optics with better than ±3% uniformity and a throughput of 200 wafers per hour in first mask mode, which results in higher yields. The Series 6000 can handle a wide variety of wafers from thick and bonded substrates (up to 7000 microns), warped wafers (up to 7 mm-10mm), thin substrates (down to 100 micron thick), and thick photo resist.
