OAI
OAI is a leading manufacturer of reliable, precision equipment for MEMS, semiconductors, nanotechnology, cleanroom automation, and for UV light measurement.
- 800-843-8259
408-232-0600 - 408-433-9904
- sales@oainet.com
- 464 South Hillview Drive
Milpitas, CA 95035
United States of America
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Surface & Volume Resistivity Meter for Nonconductive Materials
Hiresta UX
The new Hiresta-UX is a high performance meter for measuring the surface and volume resistivity of a wide variety of nonconductive materials. With an extended measurement range of 103 ~ 1014Ω, this meter is ideal for Production, Engineering, R&D and Quality Control. The new Hiresta-UX features powerful new algorithms that automatically choose the right voltage, which optimizes the surface and volume resistivity testing. This versatile, high performance resistivity meter includes a built-in switch box that can be mated with a J-Box (meets JIS K 6911 for surface & volume resistivity and is compatible with ASTM D 257) as an option. The Hiresta-UX can store up to 2,000 measurement results, which can be easily exported to a USB memory device.
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Tabletop Mask Aligner
Model 200
The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a tableop mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.
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Light and Energy Meter
Model 659
UV Light and Energy Meter for use with all wafer steppers. For over 45 years, OAI is a world leader in UV Light and Energy Measurement Instrumentation used for reliable accurate calibrated control of the photolithography processes in the Semiconductor, MEMS, Wafer Packaging and Wafer Bumping Industries. The New Model 659 is an advanced UV exposure analyzer specifically designed for use with all wafer steppers including high intensity wafer steppers. This meter averages up to 400 exposure readings, has Ethernet and USB interface for downloading recorded measurements, and has intensity range of up to 7,500mW/cm2. Probes are available in wavelength of 365nm, 400nm, 420nm & 436nm. OAI has a complete certified calibration lab to maintain the performance, quality and reliability of our meters. The Model 659 meter is traceable to NIST standards.
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UV Meters
OAI’s UV Measurement Instrumentation are the standard for Semiconductor Lithography, MEMS, Sensors, Microfluidics, UV Curing, 3-D Printing, Sterilization, Water Purification and Solar/PVC industries. For over 45 years our meters have earned a reputation for accuracy, repeatability and dependability. We offer full calibration and support services worldwide.
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Integrated I-V Test Systems
The OAI Integrated I-V Test System is perfect for R&D as well as production, the OAI Integrated I-V Test System delivers extremely accurate solar cell performance measurement. OAI’s advanced fully Integrated I-V Test System is designed to overcome the limitations of flash testing by providing a highly optimized pulse width and voltage sweep rate to match any type of solar cell’s high capacitance and slow dielectric response speed. As a result, the system produces extremely accurate measurements of solar cell I-V parameters and efficiency while leading to the most accurate test results.
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Testing for Si Solar Cells Using High Performance CCD
EL Imaging Tester
EL Testing for Si Solar Cells using High Performance CCD. The determination of luminescence (photo emissions) in solar cells is an important characterization tool. Typical solar cells often have defects which limit the efficiency or lifetime of a cell. Many of these defects are visualized with Luminescence Imaging. By using this technique, the manufacturing process can be optimized to produce better cells. Luminescence Imaging takes advantage of the radiative inter-band recombination of excited charge carriers in solar cells. The emitted photons can be captured with a sensitive CCD camera to obtain an image of the distribution of the radiative recombination in the cell. This distribution is determined by the local excitation level, allowing the detection of electrical losses, thus mapping the diffusion length of minority carriers as the emitted light is low intensity and in the near infra-red range, the CCD camera has a high sensitivity wavelength from 900 to 1100 nm with little thermal noise. This CCD camera provides excellent resolution of 1024 x 1024 pixels with a large 1μm pixel size, multi-megahertz readout speed, and robust USB 2.0 connectivity. The EL CCD Camera is the ultimate high-performance CCD camera for electroluminescence and photoluminescence imaging for Photovoltaic (PV) Cells and Modules. This camera combines low noise electronics and optimal sensitivity in NIR.
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Standard Class AAA Solar Simulator
TriSOL TSS
Essential for testing virtually any material or product that is exposed to sunlight for long or short periods of time, OAI’s low-cost, Standard Solar Simulators deliver highly collimated, uniform light. Depending on configuration, output on these Solar Simulators is rated at 350W -5,000W.These Class AAA Solar Simulators feature OAI’s Advanced Uniform Beam Optics and are available with a choice of air mass filters to reproduce a wide range of solar spectra. For added flexibility, OAI’s proven lens and collimating mirror technology allows for a variety of exposure area sizes. A Class AAA Solar Simulator is an essential tool for manufacturing as well as R&D; it is indispensable in test labs, industry, and in universities. OAI Standard Solar Simulators are used in photobiology, biomedical, solar cell testing, cosmetic testing, and paints & coatings analysis. Based on 35+ years of proven UV light technology, OAI Solar Simulator Systems deliver repeatable, reliable, constant output, and measurement uniformity.
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Mask Treatment Process
Model 100MT
OAI offers a unique process which extends the life of your mask, says good bye to tedious washing and drying of mask and thus enables your mask aligner to have increased productivity at the lowest cost of ownership. The Model 100 MT is a 2 step process.
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Handheld UV Intensity/Power Meter
Model 308
Dependable and repeatable, The OAI Model 308 UV Intensity/Power Meter is precise, direct-reading instrument designed to measure UV light intensity. The Model 308 features detachable probes for use in the UVA, UVB and UVC ranges, plus a high speed serial port and is available with an optional software package that facilitates instant data logging of intensity mode, time, wave length, serial number and calibration due date.
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Light and Energy Meter
Model 656
OAI Model 656 Meter is designed for use with all mask aligners and flood exposure systems. For over 45 years, OAI is a world leader in UV Light & Energy Measurement Instrumentation used for reliable accurate calibrated control of the photolithography processes in the Semiconductor, MEMS, Wafer Packaging and Wafer Bumping Industries.
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Stand-alone I-V Test Systems
OAI offers a complete line of high performance I -V Testers. I -V Testers and I -V Rider software may be ordered as a stand -alone system or integrated into any OAI Solar Simulator. Three standard ranges of I -V Testers are available; ≤1A, 1 -5A, 5 -10A, and 20A. Higher current testers are available as custom options. An OAI Application Engineer will work with you to insure that the I -V Tester and I -V Rider software you choose is optimized for your specific application.
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Automated Front & Backside Mask Aligner System
Model 6000
With over 4 decades of manufacturing in the semiconductor industry, OAI meets the growing challenge of a dynamic market with an elite class of production photolithography equipment. Built on the proven OAI modular platform, the Model 6000 has front and backside alignment that is fully automated with a submicron printing capability as well as submicron top to bottom front side alignment accuracy which delivers performance that is unmatched at any price. Choose either topside or optional backside alignment which uses OAI’s customized advanced recognition pattern software. These Mask Aligners have OAI’s Advanced Beam Optics with better than ±3% uniformity and a throughput of 200 wafers per hour in first mask mode, which results in higher yields. The Series 6000 can handle a wide variety of wafers from thick and bonded substrates (up to 7000 microns), warped wafers (up to 7 mm-10mm), thin substrates (down to 100 micron thick), and thick photo resist.
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Custom Solutions for Mask Aligners
OAI offers custom designed solutions built to your unique specification.
