OAI
OAI is a leading manufacturer of reliable, precision equipment for MEMS, semiconductors, nanotechnology, cleanroom automation, and for UV light measurement.
- 800-843-8259
408-232-0600 - 408-433-9904
- sales@oainet.com
- 464 South Hillview Drive
Milpitas, CA 95035
United States of America
Categories
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product
Large Substrate Mask Aligner
Model 6020
The Model 6020 is a large substrate Production Mask Aligner or Auto-flood Exposure System for RDL First Level Advanced Packaging (PLP) and markets requiring exposure of large glass panels. It is engineered with OAI’s precision, reliability, and quality that is found in all of OAI’s products. The features include wedge effect leveling, superb process repeatability, ≤ 2.0µm printing resolution, and remote diagnostics. Using robotic handling, the system can stand alone or be fully integrated with photo resist processing.
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Exposure Systems
Model 2000AF & 2000SM
The OAI Model 2000 Exposure Systems may be configured as either an edge-bead exposure system (2000SM) or a flood exposure system (2000AF); both configurations are based on OAI’s proven, time-tested platform.
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UV LED Light Source
Model 32
This new UV LED lightsource is designed and engineered by the proven lithography experts at OAI. The lightsource delivers a number of unique benefits, the most consequential of which is consistent intensity over an exceptionally long life. The lightsource is highly energy efficient, requires no maintenance or light replacement, and contains no mercury.
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TriSOL Class AAA 0.25º Collimation Angle Solar Simulators
For high performance space applications, OAI offers a 0.25 Collimation Angle Solar Simulator. It is engineered with the technology built on OAI’s 47 years of experience working with light. Features include 100mmx100mm beam size, long lens housing, AM 1.5 G and AMO spectrum up to 1800 nm or any custom spectrum, and intensity controlled up to 1.25 SUNS. These solar simulators are built with OAI’s precision, quality and reliability.
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Single Long Pulse Solar Simulator & I-V Test System
TriSOL SLPSS
The OAI Test System for HIGH EFFICIENCY SOLAR CELLS overcomes the limitations of flash testing by providing a highly optimized pulse width and voltage sweep rate to match the cell’s dielectric response speed. As a result, the system produces extremely accurate measurements of solar cell efficiency leading to increased profitability.
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Tabletop Mask Aligner
Model 200
The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a tableop mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.
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TriSOL Large Area Solar Simulators
OAI has designed and engineered for large area markets Class AAA, ABA, or ACA Solar simulators with the same performance , quality, and reliability as our other solar simulator models. These large area solar simulators are available in several models.
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UV Light Meter
Model 308T
Built for high intensity applications the NEW OAI Model 308T UV Light Meter is a dependable, direct-reading instrument designed for measuring UV light intensity for UV curing. The Model 308T features detachable probes for use in the UVA, UVB and UVC ranges, plus a high speed serial port. Accuracy of the meter is within ±3%and measurement repeatability is within ±3 LSB (least significant bit). Like all OAI precision instruments, the Model 308T provides NIST traceable measurements. This easy-to-use meter is auto-ranging from 0.1 to 1999.9 milliwatts/cm2 full scale when used with the 2000 milliwatts/ cm2 probe. The linearity of the meter in this range is at least ±(.002% + 6 LSB).
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Integrated I-V Test Systems
The OAI Integrated I-V Test System is perfect for R&D as well as production, the OAI Integrated I-V Test System delivers extremely accurate solar cell performance measurement. OAI’s advanced fully Integrated I-V Test System is designed to overcome the limitations of flash testing by providing a highly optimized pulse width and voltage sweep rate to match any type of solar cell’s high capacitance and slow dielectric response speed. As a result, the system produces extremely accurate measurements of solar cell I-V parameters and efficiency while leading to the most accurate test results.
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Wafer Bonder
AML
Wafer bonding has found many applications in the field of MST, MEMS and micro engineering. These include the fabrication of pressure sensors, accelerometers, micro-pumps and other fluid handling devices. The process is also used for first-order packaging of silicon microstructures to isolate package-induced stresses. The OAI AML Wafer Bonder facilitates both the alignment and bonding to be performed in-situ, in a high vacuum chamber. For anodic bonding the wafers are loaded cold and heated in the process chamber. For high accuracy alignment the wafers are aligned and brought into contact only after the process temperature has been reached, thus avoiding differential thermal expansion effects which can compromise alignment. The AML Wafer Bonder is excellent for anodic bonding, silicon direct and thermal compression bonding applications. These features enable the bonder to be used with virtually any processing tool.
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Custom Solutions for Mask Aligners
OAI offers custom designed solutions built to your unique specification.
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Automated Front & Backside Mask Aligner System
Model 6000
With over 4 decades of manufacturing in the semiconductor industry, OAI meets the growing challenge of a dynamic market with an elite class of production photolithography equipment. Built on the proven OAI modular platform, the Model 6000 has front and backside alignment that is fully automated with a submicron printing capability as well as submicron top to bottom front side alignment accuracy which delivers performance that is unmatched at any price. Choose either topside or optional backside alignment which uses OAI’s customized advanced recognition pattern software. These Mask Aligners have OAI’s Advanced Beam Optics with better than ±3% uniformity and a throughput of 200 wafers per hour in first mask mode, which results in higher yields. The Series 6000 can handle a wide variety of wafers from thick and bonded substrates (up to 7000 microns), warped wafers (up to 7 mm-10mm), thin substrates (down to 100 micron thick), and thick photo resist.
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