OAI
OAI is a leading manufacturer of reliable, precision equipment for MEMS, semiconductors, nanotechnology, cleanroom automation, and for UV light measurement.
- 800-843-8259
408-232-0600 - 408-433-9904
- sales@oainet.com
- 464 South Hillview Drive
Milpitas, CA 95035
United States of America
Categories
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Custom Solutions for Mask Aligners
OAI offers custom designed solutions built to your unique specification.
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TriSOL Large Area Solar Simulators
OAI has designed and engineered for large area markets Class AAA, ABA, or ACA Solar simulators with the same performance , quality, and reliability as our other solar simulator models. These large area solar simulators are available in several models.
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UV Light Meter
Model 308T
Built for high intensity applications the NEW OAI Model 308T UV Light Meter is a dependable, direct-reading instrument designed for measuring UV light intensity for UV curing. The Model 308T features detachable probes for use in the UVA, UVB and UVC ranges, plus a high speed serial port. Accuracy of the meter is within ±3%and measurement repeatability is within ±3 LSB (least significant bit). Like all OAI precision instruments, the Model 308T provides NIST traceable measurements. This easy-to-use meter is auto-ranging from 0.1 to 1999.9 milliwatts/cm2 full scale when used with the 2000 milliwatts/ cm2 probe. The linearity of the meter in this range is at least ±(.002% + 6 LSB).
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Stand-alone I-V Test Systems
OAI offers a complete line of high performance I -V Testers. I -V Testers and I -V Rider software may be ordered as a stand -alone system or integrated into any OAI Solar Simulator. Three standard ranges of I -V Testers are available; ≤1A, 1 -5A, 5 -10A, and 20A. Higher current testers are available as custom options. An OAI Application Engineer will work with you to insure that the I -V Tester and I -V Rider software you choose is optimized for your specific application.
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Front & Backside, Semi-Automatic Mask Aligner
Model 800E
The OAI Model 800E front and backside, semi-automatic mask aligner system offers advanced features and specifications found most often in costly automated production mask aligners. With the development of this mask aligner, OAI meets the growing challenge of the dynamic semiconductor and MEMS market with a new class of mask aligners that are engineered for R&D and low volume production.
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Testing for Si Solar Cells Using High Performance CCD
EL Imaging Tester
EL Testing for Si Solar Cells using High Performance CCD. The determination of luminescence (photo emissions) in solar cells is an important characterization tool. Typical solar cells often have defects which limit the efficiency or lifetime of a cell. Many of these defects are visualized with Luminescence Imaging. By using this technique, the manufacturing process can be optimized to produce better cells. Luminescence Imaging takes advantage of the radiative inter-band recombination of excited charge carriers in solar cells. The emitted photons can be captured with a sensitive CCD camera to obtain an image of the distribution of the radiative recombination in the cell. This distribution is determined by the local excitation level, allowing the detection of electrical losses, thus mapping the diffusion length of minority carriers as the emitted light is low intensity and in the near infra-red range, the CCD camera has a high sensitivity wavelength from 900 to 1100 nm with little thermal noise. This CCD camera provides excellent resolution of 1024 x 1024 pixels with a large 1μm pixel size, multi-megahertz readout speed, and robust USB 2.0 connectivity. The EL CCD Camera is the ultimate high-performance CCD camera for electroluminescence and photoluminescence imaging for Photovoltaic (PV) Cells and Modules. This camera combines low noise electronics and optimal sensitivity in NIR.
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Enhanced UV Light Source
Model 30E
The Model 30E Enhanced UV Lightsource is highly efficient and may be utilized in a variety of applications. Light is collected by an ellipsoidal reflector and focused on an integrating/condensing lens array to produce uniform illumination at the exposure plane. This UV light source is available in various beam sizes up to 24 inches square with output spectra ranging from 220 nm to 450 nm, using the appropriate lamp (included). Output power ranges from 200 watts to 5 kilowatts. All OAI UV Lightsources are easily equipped with quick-change filter assemblies, enabling the user to customize the output spectrum with little effort. Optional remote exhaust fans are available.
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Exposure Systems
Model 2012AF & 2012SM
The Model 2012AF Flood Exposure System provides a cost-effective method for automated flood exposure. Designed to accommodate wafers from 8” to 300mm, the tool features automated FOUP loading. Mask and substrate changeover can be accomplished quickly and easily adding to both versatility and high-volume throughput of this production tool.The Model 2012SM Automated Edge-bead Exposure System provides a cost-effective method for edge-bead removal using standard shadow mask technology. Designed to accommodate wafers from 8” to 300mm, the tool features automated FOUP loading. Mask and substrate changeover can be accomplished quickly and easily adding to both versatility and high-volume throughput of this production tool.
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Solar Simulators
TriSOL CPV
Concentrating Photovoltaics (CPV) has the promise of producing solar cells with high cell efficiencies, which result in a reduction in the cost of operating a PV module. However, a CPV system requires the integration of CPV solar cells, modules and CPV optics into one efficient system. OAI’s focus is CPV cell testing methodology. The CPV cells can now be tested using OAI’s advanced standalone CPV Simulators for low dose and high dose configurations. The low dose CPV Solar Simulator provides exposure up to 50 Suns, whereas, the high dose CPV Solar Simulator provides exposure up to 1500 Suns. The low and high dose simulators provide exposure in varying Sun concentrations in various beam sizes from 1.5cm x 1.5cm to 7.5cm x 7.5cm, and may be configured with OAI’s I-V Test Systems.
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Tabletop Mask Aligner
Model 200
The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a tableop mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.
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Surface & Volume Resistivity Meter for Nonconductive Materials
Hiresta UX
The new Hiresta-UX is a high performance meter for measuring the surface and volume resistivity of a wide variety of nonconductive materials. With an extended measurement range of 103 ~ 1014Ω, this meter is ideal for Production, Engineering, R&D and Quality Control. The new Hiresta-UX features powerful new algorithms that automatically choose the right voltage, which optimizes the surface and volume resistivity testing. This versatile, high performance resistivity meter includes a built-in switch box that can be mated with a J-Box (meets JIS K 6911 for surface & volume resistivity and is compatible with ASTM D 257) as an option. The Hiresta-UX can store up to 2,000 measurement results, which can be easily exported to a USB memory device.
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TriSOL Class AAA 0.25º Collimation Angle Solar Simulators
For high performance space applications, OAI offers a 0.25 Collimation Angle Solar Simulator. It is engineered with the technology built on OAI’s 47 years of experience working with light. Features include 100mmx100mm beam size, long lens housing, AM 1.5 G and AMO spectrum up to 1800 nm or any custom spectrum, and intensity controlled up to 1.25 SUNS. These solar simulators are built with OAI’s precision, quality and reliability.
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Automated Front & Backside Mask Aligner System
Model 6000
With over 4 decades of manufacturing in the semiconductor industry, OAI meets the growing challenge of a dynamic market with an elite class of production photolithography equipment. Built on the proven OAI modular platform, the Model 6000 has front and backside alignment that is fully automated with a submicron printing capability as well as submicron top to bottom front side alignment accuracy which delivers performance that is unmatched at any price. Choose either topside or optional backside alignment which uses OAI’s customized advanced recognition pattern software. These Mask Aligners have OAI’s Advanced Beam Optics with better than ±3% uniformity and a throughput of 200 wafers per hour in first mask mode, which results in higher yields. The Series 6000 can handle a wide variety of wafers from thick and bonded substrates (up to 7000 microns), warped wafers (up to 7 mm-10mm), thin substrates (down to 100 micron thick), and thick photo resist.
