MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Andover, MA 01810
United States of America
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Product
Industrial Differential Pressure Transducers
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These industrial Baratron® capacitance manometers feature differential pressure measurement, industrial enclosures, and higher operating temperature ranges for industrial applications.
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Product
Remote Plasma Sources For Process Applications
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MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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Product
Atmospheric Pressure Gas Analyzers
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The Cirrus™ single-quadrupole mass spectrometers are powerful analytical tools for a wide range of laboratory and industry-based gas analysis applications. The Cirrus family, featuring the Cirrus™ 3 and Cirrus™ 3-XD atmospheric pressure gas monitoring systems are ideal for analysis of bulk gas, gas composition, and detection of trace gasses and contamination. These powerful, versatile and customizable platforms, when combined with Process Eye™ Professional software and its recipe-based control, can significantly boost your productivity.
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Product
Process Automation Controllers
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As innovators in programmable control, communication protocols, embedded analytics, and gateway technology, MKS has the critical building blocks and experience to deliver the latest technologies for distributed automation control and process monitoring to our customers, personalized for their exact requirements.
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Product
Multi-Channel Ozone Delivery System With In-rack Chiller
SEMOZON® AX8575
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The SEMOZON® AX8575 is a fully integrated, high output ozone gas delivery system that can be configured as a multi-channel system delivering ozone for up to 4 channels supporting multiple chambers or multiple tools. It has an optional in-rack chiller for ultra-high concentrations.
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Product
Dissolved Gas Systems
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Dissolved gas in deionized water has been widely adopted in manufacturing processes in Electronics, Semiconductors, Flat Panel Displays and Solar applications. These wet techniques increase manufacturing productivity in particle lift-off and wet clean operations. Dissolved gases such as Ammonia, Carbon Dioxide and Ozone are environmentally friendly alternatives to heavy chemicals like sulfuric acid and peroxide acid solutions. MKS offers a large product line of Dissolved Gas systems that improve wet cleaning operations.
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Product
Mass Spectrometers
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Our wide range of powerful, versatile, and proven mass spectrometry-based solutions deliver a new level of understanding and control in vacuum and gas-related applications to customers.
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Product
KEINOS™ 2 MHz 5 KW, 11 KW & 13 KW RF Plasma Generators
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The KEINOS™ 2MHz plasma generator builds on the solid, reliable attributes of the existing 2MHz design. KEINOS™ incorporates the latest technology from MKS to enable demanding applications of pulsing, fast impedance changes and shorter process steps. KEINOS™ can deliver up to 13kW of power, pulsing up to 50KHz, multiple set point pulsing, pulse shaping and MKS patented frequency tuning. KEINOS™ uses an integrated VI sensor for power accuracy and digital based control for fast response times.
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Product
High Performance Baratron® Absolute Pressure Transducers
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These high performance Baratron® capacitance manometers operate at ambient temperature. They are referenced to vacuum for gas independent, direct measurement of absolute pressure.
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Product
Ozone Generators & Systems
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MKS offers a wide range of ozone generators and modular delivery systems which produce ultra-pure, reliable ozone gas. In the clean semiconductor environment, Ozone reacts with a wide range of precursor gases resulting in the creation of Al2O3, ZrO2, HfO2, and La2O3 metal oxides to enable thin film deposition processes like Atomic Layer Deposition (ALD) and Etch (ALE). MKS’ generator uses Grade 6 gas, enabling the creation of higher film density improving product yield. Photovoltaic and Display manufacturing leverage semiconductor best practices and utilize ozone to create enhanced thin film barriers, improving product performance and reliability.
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Product
Chemical Downstream Plasma Source
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The AX7610 is a microwave plasma source for remote plasma applications. With replaceable quartz or sapphire plasma tubes, the AX7610 downstream source offers configuration flexibility to meet the most demanding application process parameters. The quartz tube version is ideally suited for production of atomic oxygen, nitrogen or argon. The sapphire tube version is compatible with much more severe CF4 CHF3 and NF3 chemistries.
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Product
Dissolved Carbon Dioxide (DI-CO2) Ultrapure Water Delivery System
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The DI-CO2 is used in single substrate cleaning tools for rinsing steps to prevent ESD effects and/or corrosion by creating UPW (ultrapure water) with precisely defined conductivity. It is a compact system for tool integration, providing conductive DI-CO2 water (Carbon Dioxide) with closed loop controlled conductivity. The conductivity is kept at a constant value under changing flow conditions by control of the CO2 concentration in the DI-CO2 water.
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Product
Elite™ 13.56 MHz RF Plasma Generators
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The elite™ Series of RF plasma generators provides state-of-the art technology in a compact air-cooled package. The elite is designed with high speed closed loop control, a class E RF deck and a switching modulator for superior output performance. The elite design utilizes a single printed circuit board assembly for the full rack product virtually eliminating all internal wires and connectors and thereby providing the highest reliability available.
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Product
Paragon® 8.0 Slm NF3 Flow Intelligent Remote Plasma Source
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For cleaning CVD and ALD/ALE process chambers, the Paragon remote plasma source is designed for high gas dissociation rates (> 98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr. This leading-edge performance translates into increased process throughput and repeatable process results. The Paragon design incorporates a proprietary plasma block design with a Plasma Electrolytic Oxidation coating for low particle, long block life that delivers lower cost of ownership.
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Product
Vapor Source Mass Flow Controller With Viscous Laminar Flow
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The 1152C Vapor Source Mass Flow Controller is a pressure-based measurement and control system designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas. The 1152C consists of a fixed flow element and two capacitance manometers for flow measurement, with a proportioning solenoid control valve for flow control.


















