MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Andover, MA 01810
United States of America
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Product
Tunable Filter Spectrometers
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MKS Instruments' platform of innovative optical analyzers based on Tunable Filter Spectroscopy (TFS™) provides real-time gas analysis, while delivering customers a substantially lower total cost of ownership. TFS™ can be utilized from UV (Ultra-Violet) through IR (Infra-Red) spectral regions. MKS TFS™ sensor platforms have been on the market since 2008 with more than 2500 systems deployed.
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Product
Vacuum Gauge Controllers
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MKS offers a range of controllers that control ion gauges, heat-loss sensors, and thermocouples. Product features can be configured to meet your specific process needs. A variety of communication protocols, including RS-232, RS-485, and DeviceNet™, are available to speed and ease integration into your control scheme. In addition, many of the controllers provide local displays and a choice of set points that further simplify control system integration.
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Product
DELTA™ II 2-zone Flow Ratio Controller
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The DELTA™ II Flow Ratio Controller divides and controls mixed process gas flows to either multiple chambers or zones within a process chamber at ratios specified by the user maximizing process uniformity and repeatability. It is available with EtherCAT® or DeviceNet™ communications.
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Product
Ultra Clean, High Concentration, High Flow Ozone Generator
SEMOZON® AX8415
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The SEMOZON® AX8415 is the most innovative and versatile ozone generator developed by MKS. Ultra clean, high concentration, high flow ozone is produced by this generator's novel architecture and patented cell design, converting oxygen to >400 g/Nm3 of high concentration ozone for leading-edge applications in the semiconductor, flat panel display and photovoltaic industries.
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Product
Compact Ultrafast 50-50,000 sccm Mass Flow Controller/Meter
C-Series
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The C-Series Mass Flow Controller (MFC) is a compact, fast-response model using a Micro-Electro-Mechanical Systems (MEMS) based flow sensor for non-corrosive gas applications. It is available in Full Scale flow rates from 50 sccm to 50 slm (N2 equivalent) with a control range from as low as 0.1% of Full Scale up to 100% of Full Scale and is also available as a flow meter. Analog (0 to 5 VDC) or digital (RS485 or Modbus TCP/IP) communications interfaces are available. Required power supply voltage is 24 VDC nominal.
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Product
DELTA™ IV 4-zone Flow Ratio Controller
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DELTA™ IV 4-zone Flow Ratio Controller is a digital controlled, browser-enabled, process control instrument providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity and control. It is available in EtherCAT® or DeviceNet™ providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution.
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Product
High-concentration, High Flow Ozone Generator
SEMOZON® AX8407
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The SEMOZON AX8407 generator converts pure oxygen into ozone through silent electrical discharge and achieves high output and high concentration level. It requires only minute levels of dopant nitrogen gas, far below the levels required for competitive ozone generators. As a result, the presence of contaminants, e.g. NOx compounds, is extremely low.
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Product
915 MHz Industrial Microwave Generators
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Alter® GS Series industrial microwave generators provide 15kW to 75kW power at 915 MHz in a shielded cabinet with continuous powerline control, safety interlocks, a variety of interface options and optional remote control. The GS series design include Alter®'s proven switch mode power supply systems with continuous power control for rugged, light weight and modular microwave generator systems. This solution allows for power upgrades for industrial installation needs, offering maximum flexibility in system design.
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Product
Microwave Plasma Subsystems
AX2600 And AX2700
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The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
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Product
High Power Microwave Plasma Source
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The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.
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Product
Residual Gas Analyzers
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Residual Gas Analyzers are an effective tool to analyze system gas loads resulting from real leaks, virtual leaks or chamber wall outgassing. RGAs have a number of advantages over traditional, dedicated gas leak detectors including the ability to differentiate between different gas species, comparable sensitivity levels, the ability to detect internal or "virtual" leaks and to detect and analyze outgassing problems.
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Product
Process Sense™ NDIR End Point Detector For Chamber Clean
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The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
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Product
High Accuracy In-Situ Mass Flow Verifier
HA-MFV
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The HA-MFV, High Accuracy Mass Flow Verifier is designed for use on process tools to verify mass flow control flow rates in-situ. Available with EtherCAT® or DeviceNet™ communications and measurement accuracy of 1.0% of reading, the HA-MFV can verify MFC flow with the actual process gas significantly better than older rate-of-rise devices or process chamber rate-of rise methods.
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Product
High Temperature Absolute Pressure Transducers
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Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).


















