Plasma
An ionized gas used for flat panel displays.
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Emission Spectroscopy
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Product
Noise Location Package
Type HFDF
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National RF’s Type HFDF high frequency location system is a proven noise hunting and location directional antenna system that allows you, in many cases, to walk right up to the source of High Frequency (HF) noise! Used by several power companies around the United States, professional noise hunters, and other communications specialists, the HFDF has located noise sources that emanated from pole power transformers, arcing electric fences, CATV in-line amplifiers, plasma TV screens, and even Marijuana grower’s heating lamps! The system incorporates several plug-in, tunable magnetic loop sensors of a proprietary National RF design, that cover the frequency range between 1.8 MHz and 55 MHz. The unit is packaged in a hand-held, lightweight metallic enclosure, with a pistol grip and a magnetic compass mounted on top. The compass is used to get magnetic bearings to the noise source, which may be plotted on a map to triangulate, and ultimately pin-point, the location of the noise source. In certain cases, our customers tell us that they have been able to walk right up to the interfering noise source and correct the situation on the spot!
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Plasma Processing Systems
PlasmaSTAR
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The PlasmaSTAR® Series of Plasma Processing Systems from Axic, Inc. defines a new concept in barrel plasma processing. The systems are based on a modular design concept. Starting with a universal base unit, multiple electrode modules are available for easy insertion into the base unit. You will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma.
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Desolvating Nebulizer
Aridus3
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The CETAC Aridus3 Desolvating Nebulizer System is a specialized liquid sample introduction accessory for inductively coupled plasma mass spectrometry (ICP‑MS). The Aridus3 can enhance analyte sensitivity up to 10 times or more and can greatly reduce solvent-based interferences such as oxides and hydrides.The Aridus3 couples a low-flow (50, 100, or 200 µL/min) PFA nebulizer and a heated PFA spray chamber with an inert fluoropolymer membrane. This combination provides enhanced analyte sensitivity while reducing solvent based interferences such as oxides and hydrides. The Aridus3 is particularly advantageous for small volume and highly corrosive samples such as those generated in the earth sciences and the semiconductor industry.
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ICP-OES Spectrometers
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ICP-OES spectrometers measure the concentration of elements from ppb to % using de-excitation of atoms and ions in a plasma. The robustness of our Ultima ICP spectrometers makes them ideal for applications common to mining, chemicals manufacture, salt production, wear metals in oil analysis, petrochemical, metallurgical production and precious metal refining.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
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Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Real Time MM-Wave Frequency Analyzers up to 180 GHz
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When millimeter-wave applications came into many domains of human activity, a need for precise measurements of signal frequency spectrum has become critical. This need is quite understandable when, for example, it concerns to exploring extraterrestrial radio-sources or micro/mm-wave background emission in radio-astronomy, or measuring chemical composition of the atmosphere through the molecular emission of different its components, plasma diagnostics or many military applications.
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Interferometers and Reflectometers for Plasma Diagnostics up to 170 GHz
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Elva-1 supplies different solutions for measurement density and temperature profiles of plasma. Our systems are installed practically on all TOKAMAKs over the World.
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Product
Streak Camera
OptoScope SC-20 systems
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The SC-20 streak camera system is characterized by its large detection area of 35 mm x 4 mm and a large usable screen diagonal of 40 mm. Signals are mapped onto the fiber optic input window and measured without the need for optical reduction. In the simplest case, the entrance optics consists of a slit mask that lies directly on the entrance window. In addition, a flexible extension with a shutter, a lens mount or an adjustable slot with coupling optics is possible. The time resolution in the sub-nanosecond range qualifies the camera for many applications in detonics and plasma physics.
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Digital Dairy Refractometer, Colostrum and Blood Plasma Protein
DD-2
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The DD-2 Digital-Dairy Refractometer will provide reliable estimates of the percent solids in waste milk and colostrum quality using the Brix Method, and a blood serum total protein concentration scale can be used to assess failure of passive transfer. The MISCO Digital-Dairy™ refractometers are specifically designed to help professional dairy farmers and calf ranchers to rear healthy calves. They are rugged enough to withstand the demands of farm use, yet precise enough to give laboratory-quality readings.
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Remote Plasma Sources
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Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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High Power Microwave Plasma Source
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The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.
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Product
328mm focal length, motorized Czerny-Turner Spectrograph
Kymera 328i
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Intelligent and multi-modal spectroscopy platform for Physical and Life science. Adaptive Focus, automated optimization for the best quality of focus. 328 mm focal length, F/4.1 aperture; Ideal combination for a wide range of applications ranging from luminescence/photoluminescence spectroscopy to more demanding, higher resolution Raman spectroscopy or plasma studies.
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Optical Emission Spectrometry
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Involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
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Empowering Traditional Mass Spec
ZipChip
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The ZipChip™ separations platform uses integrated microfluidic technology to prepare, separate and electrospray biological samples directly into traditional mass spectrometers (MS). In less than 3 minutes per sample, the cost-effective ZipChip system enables analysis of a broad range of matrices from growth media to cell lysates, blood, plasma, urine, and biopharma products. Each chip provides answers on analytes from small molecules up to intact proteins, antibodies and antibody drug conjugates (ADCs). This platform provides better separation quality than most liquid chromatography (LC) instruments – in a fraction of the time – all with full MS identification behind every separations peak.
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Product
OES Spectrometers
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OES Spectrometers (Optical Emission Spectrometers for OEMs) optimized for SEMICON applications including plasma monitoring/end-point detection and reflectometry (with the addition of a flash lamp). The OES-Star features unmatched throughput and SNR, spectral coverage and < 1 nm resolution). Our new OES Family, OES-Star, VS70-MC and InVizU all include our latest “Multi-Communications interface” electronics (MC= EtherCAT, Ethernet, USB-2). The Invizu integrates both a linear CMOS sensor for UV-VIS and a TE-Cooled INGAAS sensor, which extends the spectral coverage to 1700 nm.
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
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Industry-leading performance, speed and ease of use – no compromises
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Microwave Plasma Subsystems
AX2600 And AX2700
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The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
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Product
Principle Of Optical Emission Spectrometry
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Optical emission spectrometry involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
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In Situ Diagnostics
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For researchers working on ultra thin films and novel interfaces, Neocera offers insitu, real-time process control and diagnostic tools such as high-pressure RHEED, Low Angle X-ray Spectroscopy (LAXS) and Ion Energy Spectroscopy (IES). RHEED provides exceptional growth control via RHEED intensity oscillations and the Structural data via diffraction. LAXS is a complimentary to RHEED and provides real-time Compositional information. IES provides energetics of the laser generated plasma plume which is directly responsible for obtaining high quality films and interfaces.
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High Resolution Wavefront Sensor
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Phasics wavefront sensor applies to laser beam measurement, wavefront correction through an adaptive optics loop, laser optics testing and plasma density measurement. Thus the single instrument offers true versatility to engineers and researchers in laser facility.
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Neutrals, Radicals and Ions Analysis
HPR-60 MBMS
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The Hiden HPR-60 molecular beam mass spectrometer is a compact skimmer inlet MS for the analysis of atmospheric plasma and reactive gas phase intermediates.
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High-Power Density
Apex
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The versatile Apex® family of RF generators and power-delivery systems showcases a compact, modular design suitable for chamber mounting. Utilizing sophisticated RF-conversion technology, Apex RF generators and power-delivery systems offer enhanced product and process reliability. High-density power capabilities make them ideal for advanced plasma processes. And various communications models and configurable features allow you to customize your platform and explore integration approaches. No custom generator lead times are necessary.
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Accessories for Trace Impurity, Plasma Detection and Online Trace Impurity Detectors
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Our accessories are tailored to optimise and retain gas purity at every step of the gas sample stage in order to ensure the best performance for trace impurity measurements at the ppb level.
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Plasma Profiling TOFMS
PP-TOFMS
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Plasma Profiling TOFMS addresses the needs of materials scientists across a wide range of application areas. PP-TOFMS provides fast elemental depth distribution of any inorganic material. The speed and ease of use of PP-TOFMS permit to reduce optimization time of growth processes as many research scientists strive to reduce the time from discovery to applications of new materials.The simultaneous full coverage of TOFMS available for each point of depth permits the detection of non suspected contamination. This is key for failure analysis and optimization of thin film processes that tend to no longer be based on ultra-high grade methods (i.e. ink jet printing…).
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Paragon® 8.0 Slm NF3 Flow Intelligent Remote Plasma Source
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For cleaning CVD and ALD/ALE process chambers, the Paragon remote plasma source is designed for high gas dissociation rates (> 98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr. This leading-edge performance translates into increased process throughput and repeatable process results. The Paragon design incorporates a proprietary plasma block design with a Plasma Electrolytic Oxidation coating for low particle, long block life that delivers lower cost of ownership.
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Pull Off Adhesion Tester
106
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Applications for the Elcometer 106 Adhesion Test include paint or plasma spray on bridge decking, coatings on steel, aluminium, concrete etc.Supplied in a carry case - ideal for site testsHand operated - no need for a power supplyIncludes a cutter for EN13144 and ISO 4624 tests
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ICP-OES Analyzer
SPECTRO ARCOS
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SPECTRO Analytical Instruments GmbH
The SPECTRO ARCOS ICP-OES excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials.Its unique new MultiView plasma interface option provides truly uncompromising axial-view and radial-view plasma observation in a single instrument. The periscope-free MultiView mechanism lets an operator literally "turn" a radial-view instrument into an axial-view device, or vice-versa, in 90 seconds or less. Visit the MultiView Q&A section in the ARCOS Resource Center for answers to frequently asked questions. Plasma power enters a whole new era with the system's innovative generator. This unique, compact and extremely rugged component is based on laterally diffused metal oxide semiconductor (LDMOS) technology. It delivers the highest plasma power available today, enabling previously impossible feats of analysis at the highest plasma loads.
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Remote Plasma Sources
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Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Deep Ultraviolet Spectrophotometer System
VUVAS-10X
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A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
